Page 165 - Illustrated Pocket Dictionary of Chromatography
P. 165

166     RESIDUAL SILANOL GROUPS

        residual silanol groups Silanol groups that are left on the silica
        support surface after the bonding (both primary bonded phase and
        endcapping, if done). Free silanol groups have the structure:

                                 Surface  Si  OH


                              Residual silanol group
        For many silica support materials the normal concentration of silanol
                                        2
        groups on the surface is ~8–9mmol/m . Surface silanols can be free,
        vicinal, and geminal (see vicinal and geminal entries). The presence
        of residual silanol groups is responsible in part for the extreme tailing
        that can be generated when amine-containing compounds are sepa-
        rated. Mobile-phase modifiers such as trifluoroacetic acid and tri-
        ethylamine are added to the mobile phase to help prevent interaction
        of the analyte with the residual silanol groups and thereby reduce/
        eliminate tailing.

        resin An organic polymeric support material used in various sepa-
        rations (e.g., IEC, GPC). Resins can be either macro- or microreticu-
        lar, which is a function of their manufacture and determines many of
        the resins’ physical characteristics. Resins are made from the poly-
        merization of various materials such as polystyrene with divinylben-
        zene, methacrylate, latexes, dextrans. These materials, either as is or
        further modified through the addition of functional groups, are then
        used as basic support materials in ion-exchange, size-exclusion, and
        other types of separations.

        resolution, R s or R   A quantitative measure of the distance
        between two adjacent peaks. It can be expressed in terms of reten-
        tion time difference as a multiple of summed peak widths:
                                     1 t
                           R s = 2 t  - ) (w 1  + w 2 )
                                 ( 2
        where  t 2,w 2 and  t 1,w 1 are the retention times, peak, widths for the
        second (latest) eluting peak and first eluting peak, respectively. Con-
        versely, resolution can be expressed in terms of column parameters:
                         R s =÷ (  N 4)(a 1  k k +1])
                                          ¢ [
                                             ¢
                                     - )(
        where N is the theoretical plates (column efficiency), a is the sepa-
        ration factor (system selectivity), and k¢ is the capacity factor (column
        retentivity).
   160   161   162   163   164   165   166   167   168   169   170