Page 4 - Process simulation and control using Aspen

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Preface

The future success of the chemical process industries mostly depends on the ability to
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design and operate complex, highly interconnected plants that are profitable and that
meet quality, safety, environmental and other standards To achieve this goal, the software
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tools for process simulation and optimization are increasingly being used in industry.
By developing a computer program, it may be manageable to solve a model structure
of a chemical process with a small number of equations. But as the complexity of a plant
integrated with several process units increases, the solution becomes a challenge. Under
this circumstance, in recent years, we motivate to use the process flowsheet simulator to
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solve the problems faster and more reliably. In this book, the Aspen sotware package
has been used for steady state simulation, process optimization, dynamics and closed-
loop control.
To improve the design, operability, safety, and productivity of a chemical process
with minimizing capital and operating costs, the engineers concerned must have a solid
knowledge of the process behaviour. The process dynamics can be predicted by solving
the mathematical model equations. Within a short time period, this can be achieved
quite accurately and eficiently by using Aspen flowsheet simulator. This software tool is
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not only useful for plant simulation but can also automatically generate several control
structures, suitable for the used process flow diagram. In addition, the control parameters,
including the constraints imposed on the controlled as well as manipulated variables.
are also provided by Aspen to start the simulation run. However, we have the option to
modify or even replace them.
This well organized book is divided into three parts. Part I (Steady State Simulation
and Optimization using Aspen Plus ) includes three chapters. Chapter 1 presents the
introductory concepts with solving the flash chambers. The computation of bubble point
and dew point temperatures is also focused. Chapters 2 and 3 are devoted to simulation
of several reactor models and separating column models, respectively.
Part II (Chemical Plant Simulation using Aspen Plus ) consists of only one chapter
(Chapter 4). It addresses the steady state simulation of large chemical plants. Several
individual processes are interconnected to form the chemical plants. The Aspen Plus
simulator is used in both Part I and Part II.
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