Page 206 - Challenges in Corrosion Costs Causes Consequences and Control(2015)
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184                                                 CORROSION CAUSES

           TABLE 3.15  Instruments System Automation Society Classes
           Class                   Description             Expected Time-to-Failure
           G1 (mild)        Corrosion not a factor        No corrosion-related failure
           G2 (modern)      Corrosion <1000 Å per month   Failure in 3–4 years
           G3 (harsh)       High corrosion <2000 Å per    Failure in 1–2 years
                             month
           G4 (severe)      Considerable corrosion <3000 Å  Failure in 1 year
                             per month



              The various forms of corrosion that may be encountered in the field of electronics
           are as described below.

               1. Anodic Corrosion. The spacing between components of the ICs is small,
                 and when a voltage is applied to a device, voltaic gradients of the order
                          6
                      5
                 of 10 –10 V/cm can exist across surfaces, accelerating electrochemical
                 corrosion reactions and ionic migration. In ICs, positively biased aluminum
                 metallizations are susceptible to corrosion. A combination of electric fields,
                 atmospheric moisture, and halide contamination leads to corrosion of
                 aluminum. Gold and copper metallization are also subject to corrosion under
                 these conditions.
               2. Negatively biased aluminum metallizations can corrode in the presence of
                 moisture because of the high pH (basic) produced by the cathodic reaction
                 of water reduction. The high pH can dissolve the passive oxide on aluminum
                 along with the corresponding increase in conductor resistance possibly up to
                 open-circuit value.
               3. Electrolytic Metal Migration. Detected early on in electromechanical
                 switches, this problem occurs in silver-containing compounds. In the pres-
                 ence of moisture and an electric field, silver ions migrate to the negatively
                 charged cathodic surface and plate out in the form of dendrites. The dendrites
                 grow and eventually bridge the gap between the contacts causing an electric
                 short and an arc. Large dendrites may be formed even from small volumes
                 of the metal. Under certain humidity and voltage gradient conditions, a
                 30-day exposure becomes equivalent to 4 years of service in a typical office
                 environment (42). Other metals susceptible to metal migration are gold, tin,
                 palladium, and copper.
               4. Pore-Creep in Electrical Contacts and Metallic Joints. To prevent tarnishing
                 of connectors and contacts, a noble metal such as gold is plated on the contact
                 surface. The coverage of noble metal such as gold may not be perfect, and
                 corrosion can occur at the site of imperfections. If the substrate is copper or
                 silver and exposed to either chloride or sulfur-bearing environment, corrosion
                 products can creep out from the pores and cover the gold plating with a layer
                 of high contact resistance.
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