Page 675 - Corrosion Engineering Principles and Practice
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628   C h a p t e r   1 4                              P r o t e c t i v e   C o a t i n g s    629


                         Electroplated coatings normally fail by cracking from repeated
                      expansion  and  contraction  or  impact. Another  problem  associated
                      with plating is the presence of large quantities of hydrogen on the
                      cathodic surface. Some of this hydrogen can enter the substrate metal
                      (normally steel). For low-strength steels (hardness < R 22), hydrogen
                                                                   C
                      permeation seldom poses a problem. However, the higher-strength
                      steels can be badly embrittled and fail prematurely. When poisons for
                      the recombination into molecular hydrogen, for example, S, CN, As,
                      Cd, and so on, are present in the bath, the amount of atomic hydrogen
                      absorbed can be quite high. If immediate damage is not done, the
                      parts may be baked at temperatures around 200°C to drive most of
                      the hydrogen out of the metal.
                         Thin electroplated films of gold, platinum, and silver are used on
                      electrical  contacts  and  in  electronic  equipment.  Because  gold  and
                      platinum resist oxidation, they are important in contacts where small
                      currents are being switched or passed through connections, because
                      any oxides on the contact surfaces impose unwanted resistances in
                      the circuits.

                      14.8.2  Electroless Plating
                      Electroless nickel (EN) plating is a chemical reduction process that
                      depends  upon  the  catalytic  reduction  process  of  nickel  ions  in  an
                      aqueous  solution  (containing  a  chemical  reducing  agent)  and  the
                      subsequent deposition of nickel metal without the use of electrical
                      energy. Electroless plating processes are widely used in industry to
                      meet the end-use functional requirements and are only rarely used
                      for decorative purposes.
                         In the EN plating process, the driving force for the reduction of
                      nickel metal ions and their deposition is supplied by a reducing agent
                      in solution. This plating power is thus relatively constant at all points
                      of the surface of the component, provided the agitation is sufficient to
                      ensure a uniform concentration of metal ions and reducing agents.
                      The electroless deposits are therefore very uniform in thickness all
                      over the part’s shape and size. This offers distinct advantages when
                      plating irregularly shaped objects, holes, recesses, internal surfaces,
                      valves, threaded parts, and so forth.
                         In a true electroless plating process, reduction of metal ions occurs
                      only on the surface of a catalytic substrate in contact with the plating
                      solution.  Once  the  catalytic  substrate  is  covered  by  the  deposited
                      metal,  the  plating  continues  because  the  deposited  metal  is  also
                      catalytic.
                         Nickel deposits have unique magnetic properties, except deposits
                      containing more than 8 percent phosphorus are essentially nonmag-
                      netic. In Ni-P coatings, phosphorus is present as supersaturated solu-
                      tion in fine microcrystalline solid solution, bordering on amorphous
                      or liquid-like (glass-like) metastable structure, and this phosphorus is
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