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              Noble-Gas Chemistry                                                                         461

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              The corresponding HeF and NeF cations are predicted  are already in their highest attainable oxidation states as is
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              to be unstable. Experimental evidence for ArF in the gas  exemplified by the fluorination of OsO 4 to cis-OsO 2 F 4 and
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              phase has been obtained, leading to D o (ArF ) ≥ 1.655 eV  TcO 2 F 3 to TcOF 5 by KrF 2 , and XeOF 4 to XeF by KrF .
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              and confirming the instability of HeF and NeF in their  Aqueous solutions of sodium perxenate and of xenon tri-
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              electronic ground states. The electronegativity values as-  oxide are intermediate in oxidizing strength and are useful
              signed to the compound-forming noble gases (Ar, 3.2; Kr,  for analyzing manganese and alcohols and carboxylic
              2.9; Xe, 2.3; Rn, 2.1) and those predicted for the noble  acids, respectively. Radon-222, an air contaminant in
              gases which presently do not form compounds (He, 5.2;  uranium mines, can be analyzed by means of oxidants that
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              Ne, 4.5) suggest that the values for argon and krypton are  form nonvolatile radon salts, e.g., O (dioxygenyl) cation
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              rather close and that efforts to synthesize an ArF salt  salts.
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              are realistic. The ArF cation is expected to be an even
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              stronger oxidant than KrF , making it an oxidizer of un-
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              precedented strength. However, unlike KrF , which can  SEE ALSO THE FOLLOWING ARTICLES
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              only be synthesized from KrF 2 , any synthesis of an ArF +
              salt cannot rely upon the difluoride precursor. Theoretical  NOBLE METALS • PERIODIC TABLE (CHEMISTRY) • RARE
              calculations also suggest that HC N ArF may be stable  EARTH ELEMENTS AND MATERIALS
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              (see Sections III.E and IV.C).
                                                                BIBLIOGRAPHY
              VII. APPLICATIONS
                                                                Bartlett, N., and Sladky, F. O. (1973). The chemistry of krypton, xenon
              Stable noble-gas compounds have no industrial uses  and radon. In “Comprehensive Inorganic Chemistry” J. C. Bailar, Jr.,
              at present but are frequently utilized in laboratories  H. J. Emel´eus, R. Nyholm, and A. F. Trotman-Dickenson, eds.), Vol.
              as fluorinating and oxidizing agents. Xenon difluoride  1, pp. 213–330, Pergamon, New York.
              and xenon tetrafluoride are relatively mild oxidative  Hyman, H. H., ed. (1963). “Noble Gas Compounds,” Univ. of Chicago
                                                                 Press, Chicago.
              fluorinating agents and have been used for the preparation
                                                                Laszlo, P., and Schrobilgen, G. J. (1988). Angew. Chem. Int. Ed. Engl.
              of phosphorus, sulfur, tellurium, and silicon derivatives.  27, 479.
              Xenon difluoride has proven to be a versatile and stable  Schrobilgen, G. J., and Whalen, J. M. (1994). Helium-group gases, com-
              fluorinating agent for use in synthetic organic chemistry.  pounds. In “Kirk-Othmer Encyclopedia of Chemical Technology,” 4th
              It has been used for the fluorination of alkenes in fluorode-  ed., pp. 38–53, Chap. 13, Wiley, New York.
                                                                Schrobilgen, G. J. (1992). Lewis acid properties of noble gas cations. In
              carboxylation and for the fluorination of thioethers and
                                                                 “Synthetic Fluorine Chemistry,” (R. D. Chambers, G. A. Olah, and G.
              aromatic and aliphatic compounds. Xenon hexafluoride  K. S. Prakash, eds.), pp. 1–30, Chap. 1, Wiley, New York.
              has been used to synthesize transition metal fluorides and  Selig, H., and Holloway, J. H. (1984). Cationic and anionic complexes
              oxofluorides, where the metal is in its highest oxidation  of the noble gases. In “Topics in Current Chemistry” (F. L. Boschke,
                                                                 ed.), Vol. 124, pp. 33–90, Springer-Verlag, Berlin.
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              state, e.g., Xe 2 F AuF , TcO 2 F 3 . Krypton difluoride and  Seppelt, K., and Lentz, D. (1982). Novel developments in noble gas
                               6
                          11
              its complex salts are extremely powerful oxidative fluo-
                                                                 chemistry. In “Progress in Inorganic Chemistry” (S. J. Lippard, ed.),
              rinating agents and can be used to oxidatively fluorinate  pp. 167–202, Wiley, New York.
              gold, silver, and halogen fluorides to their highest oxida-  (1970). Edelgasverbindungen, In “Gmelins Handbuch der Anorganis-
                                        +
                                   −
              tionstates,e.g.,AuF 5 ,AgF ,ClF ,BrF (seeSectionIV).  chen Chemie,” 8th ed., Main Supplement, Vol. 1, VCH, Weinheim/
                                             +
                                   4    6    6
              Krypton difluoride and XeF 6 have been used to form lan-  New York.
                                                                ˇ Zemva, B. (1988). Croat. Chem. Acta 61, 163.
              thanide(IV) fluorometallate complexes by the oxidation
                                                                ˇ Zemva, B. (1994). Noble gases: inorganic chemistry. In “Encyclopedia
              of Ln(III) in anhydrous HF solvent. Krypton species can  of Inorganic Chemistry,” (R. B. King, ed.), pp. 2660–2680, Vol. 5,
              also be used to fluorinate oxocompounds of elements that  Wiley, New York.
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