Page 596 - Bird R.B. Transport phenomena
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576   Chapter 18  Concentration Distributions in Solids  and in Laminar Flow

                           attained, the cylindrical  column of gas  is divided  into sections  as shown.  For a 4-section  appa-
                           ratus with  total height 4.22 cm, the analysis  of the gas  samples  thus obtained gives the follow-
                           ing  results:
                                       (Z  -  Zj) in cm
                                     Bottom    Top of      Mole
                           Section  of  section  section  fraction  of  A
                           I          0.10      1.10       0.757
                           II         1.10      2.10       0.641
                           III        2.10      3.10       0.469
                           IV         3.10      4.10       0.215
                           The measured  evaporation  rate  of  A  at steady  state  is  0.0274 g-moles/hr.  Ideal  gas  behavior
                           may be  assumed.
                           (a)  Verify  the following expression  for  the concentration profile  at steady  state:




                           (b)  Plot the mole  fraction  x B  in each  cell versus  the value  of  z at the midplane  of  the cell  on
                           semilogarithmic  graph paper. Is a straight  line obtained? What  are the intercepts at z ]  and  z ?
                                                                                                    2
                           Interpret these  results.
                           (c)  Use the concentration profile  of  Eq. 18B.12-1  to find  analytical  expressions  for  the average
                           concentrations in each section  of the tube.
                           (d)  Find the best value  of ЯЬ  from  this experiment.
                                                  АВ
                                           2
                           Answer: (d) 0.155  cm /s
                    18B.13.  Tarnishing of  metal surfaces.  In the oxidation  of  most metals  (excluding  the alkali  and  alka-
                           line-earth metals) the volume  of  oxide  produced  is  greater  than that  of  the metal  consumed.
                           This  oxide  thus  tends  to  form  a  compact  film,  effectively  insulating  the  oxygen  and  metal
                           from  each other. For the derivations  that follow, it may be assumed  that
                           (a)  For oxidation  to proceed, oxygen must diffuse  through the oxide  film  and that this  diffu-
                           sion follows Fick's  law.
                           (b)  The free  surface  of the oxide  film  is saturated  with oxygen  from  the surrounding  air.
                           (c)  Once the film  of  oxide  has become reasonably  thick, the oxidation  becomes  diffusion  con-
                           trolled; that is, the dissolved oxygen concentration is essentially  zero at the oxide-metal  surface.
                           (d)  The rate of change  of dissolved oxygen content of the film  is small  compared to the rate of
                           reaction. That is, quasi-steady-state  conditions may be  assumed.
                           (e)  The reaction involved  is \xO 2  + M  —> МО .
                                                               Л
                           We  wish  to  develop  an  expression  for  rate  of  tarnishing  in  terms  of  oxygen  diffusivity
                           through  the oxide  film,  the densities  of  the metal and  its  oxide, and  the stoichiometry  of  the
                           reaction. Let c  be the solubility  of  oxygen  in the film,  c  the molar  density  of  the film,  and  Z(
                                      o                                 f
                           the thickness  of the film.  Show that the film  thickness  is



                           This result, the so-called  "quadratic law/  gives a satisfactory  empirical correlation  for  a num-
                                                           7
                           ber  of  oxidation  and  other  tarnishing  reactions. 10  Most  such  reactions  are, however,  much
                           more complex than the mechanism given  above. 11


                              10
                                G. Tammann, Z. anorg. allgem. Chemie, 124, 25-35 (1922).
                              11
                                W. Jost, Diffusion,  Academic Press, New York (1952), Chapter  IX. For a discussion  of the oxidation
                           of silicon, see R. Ghez, A Primer of Diffusion Problems, Wiley, New York (1988), §2.3.
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