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                   53. Lorenz, H., et al., High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and
                       its applications for MEMS, Sensors and Actuators A, 64, 33–39, 1998.
                   54. Choi, Y., et al., High aspect ratio SU-8 structures for 3-D culturing of neurons, 2003
                       ASME International Mechanical Engineering Congress, IMECE2003–42794.


































































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