Page 627 - Bird R.B. Transport phenomena
        P. 627
     Problems  607
                                     1                    Fig.  19B.4.  Oxidation of silicon.
                              Sit)
                                                    SiO ?
                    4 V  •:.•'•••:••.•
                       v                /
                          Si           Si  + O 2  -> SiO 2
             19B.4.  Oxidation  of  silicon  (Fig. 19B.4). 1  A slab  of  silicon is exposed  to gaseous  oxygen  (species A)
                    at pressure p, producing a layer  of silicon dioxide (species B). The layer extends from the sur-
                    face z = 0, where the oxygen  dissolves  with concentration c A0  = Kp, to the surface  at z = 5(0,
                    where the oxygen  and silicon undergo a first-order reaction with rate coefficient  /c". The thick-
                    ness 5(0  of  the growing  oxide layer  is to be predicted. A quasi-steady-state method is  useful
                    here, inasmuch as the advancement of the reaction front is very  slow.
                    (a)  First solve the diffusion  equation of  Eq. 19.1-18, with the term dc /dt  neglected, and apply
                                                                          A
                    the boundary conditions to obtain
                    in  which the concentration c  at the reaction plane is as yet unknown.
                                           A8
                    (b)  Next use an unsteady-state molar O  balance on the region 0 < z < 5(0 to obtain, with the
                                                    2
                    aid  of the Leibniz formula  of §C3,
                                                                                       (19B.4-2)
                                                  at       az
                    (c)  Now write an unsteady-state molar balance on SiO  in the same region to obtain
                                                               2
                                                   +k" c  = ±j.                        (19B.4-3)
                                                      } AS
                    (d)  In Eq.  19B.4-2, evaluate  dS/dt  from  Eq.  19B.4-3 and  dcjdz  from  Eq.  19B.4-1. This  will
                    yield  an equation for c \
                                      M
                                             ~®A~B~   \    %я) М  =  Сл °              (19В.4-4)
                    Inserting  numerical  values  into  Eq.  19B.4-4  shows  that  the  quadratic  term  can  safely  be
                    neglected. 1
                    (e)  Combine Eqs. 19B.4-3 and  19B.4-4 (without the quadratic term) to get a differential  equa-
                    tion for 5(0. Show that this leads to
                                                  Jr-  + £  = VW                        (19B.4-5)
                                                 1
                    which agrees with experimental  data.  Interpret  the result.
              19B.5.  The  Maxwell-Stefan  equations  for  multicomponent  gas  mixtures.  In  Eq.  17.9-1  the
                    Maxwell-Stefan  equations  for the mass fluxes  in a multicomponent  gas system are given. Show
                    that these equations  simplify  for a binary  system  to Fick's first law, as given in Eq. 17.1-5.
              19B.6.  Diffusion  and chemical  reaction  in a liquid.
                    (a)  A solid  sphere  of  substance  A  is suspended  in  a liquid  В in which  it is  slightly  soluble,
                    and  with which it undergoes a first-order  chemical reaction with rate constant k". At  steady
                        1
                        R. Ghez, A Primer of Diffusion Problems, Wiley-Interscience, New York (1988), pp. 46-55; this book
                    discusses a number of problems that arise in the microelectronics field.
     	
