Page 398 - Tunable Lasers Handbook
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358     Paul Zorabedian


                  2.6. 7  Vertical Guiding
                      Modern  diode lasers  are double heterostructures in the  vertical direction.
                  A thin active layer is sandwiched between top and bottom cladding layers. the
                  top layer being y-type and the bottom !?-type. The active layer is composed of
                  a different  semiconductor material having a lower band gap and consequently
                  a slightly  larger  index  of  refraction  than  the p  and  17  cladding  layers that  lie
                  above  and  below  it.  The  layers  are  comprised  of  various  binary  compounds
                  and their associated  lattice-matched  ternary  or quaternary  alloys. The relative
                  position  of  the materials in the sandwich depends on whether the band  gap of
                  the binary is larger or smaller than that of the alloy. For example. in the case of
                  a GaAs/GaAlAs laser, the active layer is composed of  GaAs and the cladding
                  layers are composed of  GaAlAs. In the case of  an InP/GaInAsP laser, on the
                  other hand, the  active layer is GaInAsP and the cladding  layers are InP. In  a
                  double-heterostructure  device, the carriers  are vertically  confined by potential
                  barriers  and the photons  are vertically  confined by  the refractive index gradi-
                  ents  of  the  slab  waveguide  formed  by  the  cladding  and  active  layers.  The
                  active layer thickness in conventional lasers is -0.1  pm, while in quantum-well
                  lasers the active layer thickness is about an order of magnitude thinner-about
                  10 nm.

                  2.6.2 Active Region  Vertical Structures
                      Laser diodes can be  subdivided into two main categories according to the
                  thickness of their active regions [9].

                  2.6.2.1 Bulk Active Region
                      Conventional lasers have active regions that are about -0.1  pm thick. At this
                  magnitude, the carriers in the active region material exhibit the same properties
                  as in bulk material. The active regions of  conventional laser diodes are grown
                  either  by  liquid-phase  epitaxy  (LPE)  or  vapor-phase  epitaxy,  which  is  also
                  known  as  metalorganic  chemical  vapor  deposition  (MOCVD).  Conventional
                  growth methods are the most amenable to low-cost, high-volume production.

                  2.6.2.2  Quantum-Well Active Region
                      When  the thickness  of  the  active region  is reduced  by  about  an order  of
                  magnitude to -10  nm, the carriers  exhibit properties  that  differ from the bulk
                  because  of quantum  confinement. Such devices are called quaiiturn-$%>ell laser.
                  diodes. Quantum-well active regions can be grown by MOCVD or by molecu-
                  lar-beam  epitaxy  (MBE). When  used  as  gain  media  in  ECLs,  quantum-well
                  lasers have advantages in terms of lower threshold current and increased tuning
                  range.
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