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                            CAMS IN MICROELECTROMECHANICAL SYSTEMS         507

            plays, light modulators, switches, gas chromatographs, etc., are some of the many devices
            that appeared in that period. Some of these pioneering works are described in Trimmer
            (1990). An excellent review article (Petersen, 1982) also has a good description of the
            early applications of MEMS and the manufacturing techniques used to make them. Today,
            commercial applications of MEMS are in inertial measurement devices such as accelerom-
            eters and gyroscopes; microoptical devices such as displays; telecommunication devices
            such as mechanical filters, aligners, and switches; microfluidic devices such as valves,
            pumps, flowchannels for biochemical lab-on-a-chip devices, and ink-jet printer heads, to
            name a few. Many other applications have emerged and are likely to enter the commer-
            cial market in the near future.
               From a mechanical perspective, the principle of operation of most MEMS devices is
            rather simple. For example, a micromechanical accelerometer consists of an inertial mass
            suspended with an elastic structure. It can be as simple as a cantilever with a mass attached
            to  its  free  end. The  movement  of  the  mass  is  measured  by  one  of  a  variety  of  means
            and is used to estimate the acceleration of the body on which the device is mounted. A
            typical  MEMS  pressure  sensor  consists  of  a  membrane  that  deflects  in  response  to
            increased pressure. Its deformation is measured using a transduction technique to estimate
            the  pressure.  The  same  membrane  when  actuated  in  a  controlled  manner  can  be  used
            as a pump. A system of vibrating masses attached to each other with beams serves as a
            mechanical  filter.  Flat  structures  attached  to  beams  that  twist  act  as  micromechanical
            mirrors used in projection displays. The majority of MEMS devices developed until now
            use  very  simple  mechanical  structures  (beams,  membranes,  and  plates)  that  elastically
            deform. Thus, the significance of such devices lies not in their mechanical structure but
            in  the  transduction  scheme  based  on  physical,  chemical,  and  biochemical  phenomena
            and  of  course  micromachining. A sourcebook  on  micromachined  transducers  (Kovacs,
            1998)  describes  them  comprehensively.  In  contrast,  the  emphasis  in  this  chapter  is  on
            those MEMS devices in which there is relative motion and motion and force transmis-
            sion among rigid bodies with intermittent or sustained contact. Whether elastic deforma-
            tion is used or rigid-body motion is used, materials and the processing techniques play a
            crucial role in the development of MEMS. These two are discussed in the following two
            sections.



            15.3 MATERIALS FOR MEMS

            Silicon has turned out to be an excellent mechanical material, and it has played a key role
            in the development of MEMS technology so far. A number of other materials are also
            appearing in MEMS devices. The choice of a material depends largely on the fabrication
            technology  used  to  make  MEMS  devices.  In  this  respect,  the  development  of  MEMS
            materials and fabrication processes can be divided into four phases (NRC, 1997). The first
            phase consisted of the early years (1965 to 1985) when “old” materials and “old” processes
            of  microelectronics  were  used  to  make  MEMS  devices.  These  materials  were  silicon,
            oxide  and  nitride,  quartz,  and  some  metals.  The  processes  were  deposition  and
            photolithography-based  etching  of  thin  films.  In  the  second  phase,  microelectronic
            processes were developed further into new micromachining processes but still used the
            old materials. The new processes include a sacrificial layer that enable the fabrication of
            releasable structures, bulk etching techniques that can also create releasable structures,
            some wafer-bonding techniques, and deep lithography and micromolding techniques. The
            third phase used “new” materials such as polymers, ceramics, metals, and some active
            materials but processed them with existing “old” techniques. The fourth phase will be to
            develop new processes for these new materials. The MEMS field is now in the third phase
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