Page 47 - High Power Laser Handbook
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Excimer Lasers     19


                      Figure 2.1
                      Schematic electron   W/eV                    Kr* + F
                      transition of a
                      248-nm excimer
                      laser from the      5
                      excited state to
                      the ground state.   4             E = h*ν

                                          3                    5 eV ~ 248 nm
                                          2

                                          1
                                                                     Kr + F
                                                     r 0                r

                      such as neon or helium. In the neutral channel, an excited-state rare gas
                      atom (Kr*) reacts with a halogen molecule (F ). These reactions take
                                                            2
                      place on a nanosecond (ns) timescale, with upper-level production effi-
                      ciencies of several tens of percent. The excited KrF* molecule remains
                      unstable in the upper state and decays after several nanoseconds via
                      emission of a photon into Kr and F. The Kr and F components that form
                      the ground state are then available for another excitation cycle. Because
                      the excitation rate must compete with fast quenching processes, colli-
                      sions, and nonradiative decay, it requires high pump power densities,
                      which can only be obtained in a pulsed system. Thus, excimer lasers
                      intrinsically operate in the pulsed mode with high peak power.


                 2.2  Technology and Performance of Excimer Lasers

                      2.2.1  Principal Design and Technology
                      After more than 30 years of engineering, excimer lasers have reached
                      high  maturity.  Several  design  aspects  differentiate  the  excimer  laser
                      construction from that of other lasers. In addition, specific technologies
                      have been developed to take advantage of the favorable operational
                      conditions offered by the excimer laser. Because the laser’s gas mixture
                      contains one of the halogens fluorine or chlorine in small concentra-
                      tions, it is of the utmost importance to select materials that will avoid
                      consumptive reactions. Operation with relatively large gas volumes at
                      gas pressures of up to 6 × 10 pascals (Pa) demands leak-tight, high-
                                               5
                      strength mechanical construction. Discharge voltages of more than 40
                      kilovolts (kV) are used for the excitation that determines the use of effi-
                      cient high-dielectric-strength insulators. Performance thus relies on the
                      excimer laser design, choice of materials, and production techniques. 3
                         An  important  design  factor  of  excimer  lasers  is  the  excitation
                      method. The technology that is almost exclusively used in high-power
                      industrial  excimer  laser  systems  is  the  high-pressure  gas  discharge
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