Page 58 - High Power Laser Handbook
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30    G a s , C h e m i c a l , a n d F r e e - E l e c t r o n L a s e r s                                                           Excimer Lasers     31


                     100000000

                      10000000
                      1000000
                    Occurrence (log. scale)  100000         3% p2p energy stability


                        10000
                                                            99.999% of laser pulses
                                                            62 Mpulses in histogram
                         1000
                         100

                          10
                           1
                              95  96   97   98  99  100  101  102  103  104  105
                                               Relative energy (%)
                 Figure 2.11  Histogram of peak-to-peak energy stability measured at 600-Hz,
                 540-W output power at 308-nm (XeCl) wavelength.


                      production conditions over a two-day working period to enable the
                      uninterrupted production of the system. In the context of an anneal-
                      ing  application,  which  is  sensitive  to  the  exact  energy  of  a  single
                      laser pulse, the achievement of this very tight energy distribution is
                      one of the key requirements to reach a high yield.
                         Since  the  first  commercial  introduction  of  the  excimer  laser  in
                      1975 by Lambda Physik, its performance has been rapidly improved.
                      Pulse  energies  have  been  increased,  such  that  special  lasers  today
                      deliver up to 10 J per pulse. In addition, repetition rates, as used in
                      advanced microlithography, have increased up to 6 kHz. The tremen-
                      dous improvement of excimer laser performance is best seen in the
                      development  of  the  available  output  power  over  time.  In  1976,
                      the first commercial products delivered up to 2 W of UV output using
                      the most efficient excimer gas (KrF) with emission at 248 nm. Until
                      1985, these lasers were used solely for scientific applications, such as
                      photo-ionization, UV chemistry, and spectrometry. In 1985, the power
                      level of 100 W became commercially available; these lasers used the
                      XeCl gas mixture with emission at 308 nm and started the industrial
                      application of the excimer for polymer ablation and other materials
                      processing.
                         Soon after power levels were further increased and stabilized.
                      The 300-W power level, which became available in 2000, led to wide
                      adoption of the excimer in the flat panel display industry. Only part
                      of the widespread industrial applications of the excimer demand
                      very high power in excess of 100 W. Figure 2.12 shows the roadmap
                      of  the  output  power  of  a  commercial  excimer  laser.  In  2010,  the
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