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62    G a s , C h e m i c a l , a n d F r e e - E l e c t r o n L a s e r s                                                          Chemical Lasers     63


                      (1) mixing of large-scale structures, such as jets; and (2) local, diffu-
                      sional mixing between large-scale structures, whose mixing may be
                      somewhat augmented by local turbulence and simple diffusion.
                      Pressure Recovery
                      CW  laser  devices  typically  operate  at  relatively  low  pressures,
                      which means that in mobile systems, one must either use a chemical
                      or microporous absorbent pump, such as a zeolite, or use an exter-
                      nal  pump,  such  as  a  single-  or  multiple-stage  ejector  system,  to
                      maintain the required low operating pressures. As shown in Fig. 3.16,
                      an  ejector  consists  of  several  sections,  including  a  gas  generator;
                      supersonic mixing nozzles, which inject the gas into the subsonic
                      laser flow; a constant-area supersonic diffuser region, in which the
                      mixture is converted from supersonic to subsonic flow via two- or
                      three-dimensional  shock  interactions;  and  a  subsonic  diffuser
                      expansion region, which further slows the flow to yield an addi-
                      tional pressure increase. To gain added pressure recovery, the laser
                      itself also contains supersonic and subsonic diffusers in series that
                      work on the same principle. These diffusers, however, rely on the
                      laser cavity itself to supply the mixed supersonic flow.

                      3.3.6  Variations on Continuous Wave HF and DF Devices

                      HF and DF Overtone Lasers
                      In addition to lasing on fundamental HF transitions (∆v = 1), it is
                      also possible to lase on overtone (∆v = 2) transitions. However, the
                      gain is reduced due to substantial reductions in the associated Ein-
                      stein coefficients. Furthermore, it is necessary to use resonator con-
                      cepts  that  accommodate  the  substantially  reduced  gain,  while
                      simultaneously  suppressing  the  higher-gain  fundamental  laser
                      transitions.  Moderate-sized  CW  devices  have  been  constructed
                      using approaches somewhat similar to those used for more conven-
                      tional low-pressure (∆v = 1) devices. Note that the above discussion
                      has  primarily  used  HF  as  an  example;  however,  DF  device
                      approaches are very similar to HF ones.



                                    Supersonic nozzles  Supersonic diffuser
                       Laser diffusers
                       Laser
                       flow
                       (subsonic)
                                             Mixing region        Subsonic diffuser

                                   Gas generator
                      Figure 3.16  Schematic drawing of a typical laser pressure recovery system.
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