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                   306                       MEMS and Microstructures in Aerospace Applications


                   state is flaccid and must be stretched to provide the mechanical protection
                   from debris impact. To ensure a taut connection, the CP1 is procured in a taut
                   configuration, and then epoxied to one side of the window and then cured. Sand-
                   wiching the CP1 attach between the two windows, reinforces the connection.
                   With the window assembly in place, the CP1 film is suspended several millimeters
                   above the shutters, thus providing a barrier layer between the actual die and the
                   environment.
                       Electricalconductivityofthefilmisachievedthroughapplication ofathincoating
                   of indium tin oxide (ITO), a transparent electrical conductor. In sufficiently thin
                   coatings ITO does not change the IR performance of the window. ITO coating serves
                   toprotecttheCP1fromdegradationinthepresenceofatomicoxygen.Allthestructural
                   members of the MEMS shutter array radiator assembly were made of aluminum 6061
                   and finished with a clear anodize treatment, followed by a yellow irridite.
                       An exploded view of the MSA radiator assembly is shown in Figure 13.4.
                   Additional information on the packaging of MEMS devices is found in Chapter 12
                   but clearly contamination, handling concerns, and functionality are the key ingre-
                   dients to successful packaging scheme.


                   13.7 CONCLUSION
                   For space applications, MEMS devices are susceptible to environment-induced
                   damage both on-ground and on-orbit. The potential damage may occur at any
                   stage of the mission but they are especially prone to surface contamination prior
                   to the prepackage phase.
                       The damage impact is alleviated by implementing prudent handling and con-
                   tamination control practices. Facility for manufacturing and assembly must be
                   maintained at adequate cleanliness conditions with proper procedures established.
                   Personnel handling MEMS devices must be properly trained with special attention
                   to preclude ESD damage to the devices. To achieve the best protection, MEMS
                   devices must be isolated in a hermetic package or protected with covers whenever
                   possible.
                       CCP delineates a comprehensive contamination control program for a mission.
                   MEMS devices as an integral part of the mission must follow handling and
                   contamination guidelines established in the CCP in order to meet mission require-
                   ments.


                   REFERENCES

                    1. C.H. Mastrangelo and G.S. Saloka, Dry-release method based on polymer columns for
                       microstructure fabrication, Proceedings of the 1993 IEEE Micro Electro Mechanical
                       Systems — MEMS, February 7–10 1993, Fort Lauderdale, FL, USA, IEEE, Piscataway,
                       New Jersey, pp. 77–81 (1993).
                    2. G.T. Mulhern, D.S. Soane, and R.G. Howe, Supercritical carbon dioxide drying for
                       microstructures, Proceedings of the 7th International Conference on Solid-State Sensors
                       and Actuators, Transducers ’93, Yokohama, Japan, pp. 296–299 (1993).




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