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248 Index
photo-electric, 26 reflectivity difference, 77
photo-electrochemical, 26 refractive index, 118, 190
photocantilever, 180 refractive index grating, 188
photochemical reaction, 117 relative refractive index, 186
photoelectric effect, 20 reliability, 158
photoelectrochemical effect, 20 remote power supply, 29
photoforming, 7, 151 replication, 10
photoforming conditions, 152 reproducibility, 180
photolithography, 3, 149 research-oriented, 29
photon tunneling, 117 residual stress, 11, 16
photopolymerization, 8 resin, 8
photothermal, 26 resolution, 8
photothermal deflection, 68 resonant field, 117
photothermal effect, 20 resonant frequency, 55, 68, 79
photothermal excitation, 52 resonant MC, 52
photothermally driven MC, 67 resonant mode, 117
photovoltaic microdevice, 20 resonant sensor, 22, 52
phthalocyanine, 57 reverse torque, 136
piezoelectric, 26 Reynolds number, 11, 138
piezoelectric transducer (PZT), 181 ringlike microobject, 112
pinhole, 186 rotary actuator, 58
planar light waveguide circuit (PLC), rotating, 103
188 rotation rate, 122, 132
planar lightwave circuits (PLCs), 16 rotational direction, 121
PMT, 186 rough positioning, 183
point-spread function, 195 round trip, 38
polarizability, 186 round-trip number dependence, 174
polyimide, 150
polysilicon, 3, 16 s-polarization, 86
polystyrene, 105 S-shape curve, 182
power margin, 78 Sacrificed layer, 149
pressure, 137, 142 sacrificial layer, 14
pressure perturbations, 163 sample chamber, 154, 186
pressure sensors, 3 sample surface, 190
probe vertical displacement, 193 sampled servo, 61
probing technologies, 2 Sb mask layer, 199
Sb-super-RENS, 199
Q-switched YAG, 117 scaling laws, 11
quarter-wave plate, 104 scanning electron microscopy (SEM),
190
ray optics (RO) model, 85 scanning near-field microscopy, 168
ray tracing, 128 scanning near-field optical microscopy
Rayleigh regime, 85 (SNOM), 117
reactive dry-etching (RIBE), 51 scanning velocity, 188
reactive ion beam etching (RIBE), 2, 4, scattered-type super-RENS, 212
24, 59 scattering force, 88, 123
read power dependence, 210 search size, 158
recognition, 29 selective etching, 11
reflectivity coating (HRC), 76 sharpened optical fiber, 179
