Page 13 - Power Electronics Handbook
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6  Power semiconductor devices
                                                                  A-     Pull and rolaie mechanltm

                                                           M-
                                                                       Growing crystal
                                 000                               flkseed crystal
                             Molten zone   Silicon crystal                 Silica linei
                                                              Melt
                                                                                 healing
                                                                                      coil
                                                                                AF
                                                            v
                        (E)
                                                           Ib)   Graohite crucible



                                  Crystal

                        0               RF heating coil
                        0
                        0
                        0          0
                                                           I
                                  Silicon bar                  Meil     I

                       (4
                        Figure 1.1 Semiconductor bulk crystal purification and growth systems: (a) zone-levelling;
                        (b) Czochralski growing; (c) floating zone-refining; (d) pedestal pulling


                        which cause an area in the silicon to melt. This molten area is moved down
                        the silicon, to one end of the crystal, as the silica crucible moves along the
                        tube. Impurities in the silicon are camed by the molten area to the end
                        region,  so  that  after several passes this end can be  cut  off, leaving a
                        relatively pure section of  silicon behind.
                          Although the zone-levelling method is simple and cheap to operate, it
                        gives  a  relatively  high  level  of  residual  impurities  and  poor  crystal
                        structure, since the silicon cools in contact with the silica crucible. The
                        Czochralski growth method overcomes these problems by avoiding contact
                        between the crystal and its crucible. In this system a tiny seed of  silicon
                        crystal is lowered into a bath of molten silicon, contained in  a graphite
                        crucible. The seed is rotated and slowly withdrawn from the molten bath.
                        This causes the silicon from the melt to settle on the seed crystal and to
                        cool, resulting in the formation of  a bar of pure silicon.
                          The floating zone-refining method uses  an r.f.  heating coil, which  is
                        slowly moved along the length of  a silicon bar. This results in a molten
                        layer of silicon moving along the bar, carrying impurities with it, which can
                        eventually be  cut  off from the  end  of  the  silicon bar.  The  method  is
                        therefore similar to the zone-levelling technique of  Figure l.l(a), except
                        that the risk of  contamination is considerably reduced, since the silicon is
                        not in contact with a crucible.
                          The pedestal-pulling technique is similar in principle to the Czochralski
                        method except that the melt is formed in the surface of  the impure silicon
                        bar itself, so  that risk of  contamination from the use of  a crucible is once
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