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PHOTOMASK

8.8 SEMICONDUCTOR FUNDAMENTALS AND BASIC MATERIALS

BIBLIOGRAPHY

1. Levinson, H. J., Principles of Lithography, Bellingham, WA: SPIE Press, 2001, pp. 229–253.
2. Cha, B. C., et al., Proceedings of the 17th Annual Symposium on Photomask Technology and Management,
J. A. Reynolds, and B. J. Grenon, (eds.), Vol. 3236, pp. 34–37, Bellingham, Washington: SPIE, 1992.
3. International Technology Roadmap for Semiconductors, 2003.
4. Kimmel, K., Proceedings of the 23rd Annual Symposium on Photomask Technology and Management, K. Kimmel
and W. Staud (eds.), Vol. 5256, pp. 331–343, Bellingham, WA: SPIE, 1992.

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