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PHOTOMASK
PHOTOMASK 8.7
ITRS roadmap-mask CD uniformity (3σ)
6.0
5.0
4.0
Nanometers 3.0
2.0
1.0
0.0
2004 2005 2006 2007 2008 2009
Year of production
Binary isolated lines Alternating phase shift isolated lines Contacts/vias
FIGURE 8.3 Photomask CD uniformity chart.
Technology Roadmap for Semiconductors (ITRS) roadmap indicates that over the next 5 years,
data file sizes will grow eightfold (Fig. 8.4). This puts additional pressure on the industry to place
the development of these software tools on a fast track. The potential for even greater data prepara-
tion errors will be a risk few semiconductor firms will wish to take.
Data volume
1800
1600
1400
1200
Gigabytes 1000
800
600
400
200
0
2004 2005 2006 2007 2008 2009
Year of production
Data volume
FIGURE 8.4 Photomask data volume expansion.
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