Page 290 - Academic Press Encyclopedia of Physical Science and Technology 3rd Polymer
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 Encyclopedia of Physical Science and Technology  En012c-604  July 26, 2001  16:2







              Polymers, Thermally Stable                                                                  799

                                  CO          CO                   CO          CO
                                N                N      O        N               N
                                  CO          CO               x   CO          CO
                                                   (XLVII)                             C C


                                                                                             y
                                                                     (CF 3 )
                                       CO     C(CF 3 ) 2  CO     CO     CO
                                     O                    O    O           O
                                       CO               CO       CO     CO
                                                                     (CF 3 )
                                                                  CF 3
                                     H 2 N           NH 2
                               e.g.,
                                            C(CF 3 ) 2     H 2 N         NH 2
                                                                    CF 3

                               H 2 N                      NH 2
                                            C(CF 3 ) 2
                                                                H 2 N    C      NH 2
                                     O                O
                                                                         CF 3



                Two aspects of polyimide development that have re-  considered for use as very low dielectric constant insulat-
              cently received strong research attention are, first, the use  ing materials.
              of polymer thin films as gas separation membranes (per-
              meability and permselectivity) and, secondly, their use as
                                                                  b. Addition polyimides. Addition polyimides are
              low dielectric constant material for microelectronic de-
                                                                based on short pre-imidized units end-capped with reac-
              vices. In both of these applications, the most recent ad-
                                                                tive (unsaturated) aliphatic or cycloaliphatic groups. Poly-
              vances have featured the introduction of fluoro groups
                                                                merization occurs at relatively low temperature and pres-
              as links between phenylene rings and/or as phenyl-ring
                                                                sure by chain extension/cross-linking processes. Good
              substituents in the polmer chain. Examples of polyimide
                                                                flow/wetting characteristics of the low-molecular-weight
              dianhydride and diamine precursors are shown below.
                                                                prepolymers have played a key role in the successful de-
                In both applications, the high thermal stability and ex-
                                                                velopment of such systems as matrix resins in advanced
              cellent mechanical properties observed in polyimides are  carbon fiber reinforced composites.
              important. In the former case, simultaneous improvements  Currently, bismaleimides (XLVIII) are considered to
              to permeabilities and permselectivities have been achieved  be the most successful of the addition polyimides based
              by the reducing packing and local motion of polymer  on their performance-to-cost characteristics. Alone, they
              chains in the fluoro-polyimides.                   are most effectively thermally polymerized, in the pres-
                It has been suggested that the presence of, for exam-  ence of free-radical catalysts, to produce the cured resin
              ple, —C(CF 3 ) 2 groups in the polyimide chain lowers the  directly. Alternatively, using nonstoichiometric mixtures
              dielectric constant by decreasing interchain electronic in-  of BMI and aromatic diamine, under carefully controlled
              teractions. Certainly, the key to the successful production  conditions, cured resins are produced via the initial for-
              of microelectronic components is the lowest attainable di-  mation of the polyaspartimide (XLIX).
              electric constant insulating material. The fluorinated poly-
              imides referred to above have emerged as a favored class            CO      CO
              of such materials.                                                    N  R  N
                                                                                  CO      CO
                Applications that require this high level of performance            (XLVIII)
              include thin-film wiring in high-density electronic pack-
              aging such as large-scale and very-large-scale (LSI and  R =  CH 2                CH 2  C(CH 3 ) 2  CH 2
              VSLI) integrated circuits; fibers used in low dielectric con-
              stant laminates for high-speed multilayer printed wiring                   CH 3
              boards (PWBs); and foamed films (“nanofoams”), incor-  or
              porating nanometer-length scale voids, which have been  R = ( Aryl-sulfone-ether ) n     ;  ( Aryl-carbonate-sulfone ) n
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