Page 253 - Gas Wettability of Reservoir Rock Surfaces with Porous Media

Application of Gas Wettability CHAPTER 6 237

Table 6.20 Design of Cutting Cleaning Agent Formula
Agent Effect
Surfactant-type gas- Core element, make cuttings hydrophobic and
wetting alteration agent oleophobic, increase degreasing effect
Polypropylene-based Essential component
propyl sulfate
Anionic surfactant A Essential component
Anionic surfactant B Essential component
Nonionic surfactant C Essential component
Nonionic surfactant D Essential component
Nonionic surfactant E Essential component
Water Solvent
Butyl lactate Solvent
Additives Antifoaming Prevent excessive foaming during production
agents
pH modifier Adjust pH to around 7
软水剂Water Complex Ca and Mg elements in water
softener
Preservative Prevent product deterioration
Corrosion Prevent corrosion to equipments
inhibitor

cuttings generated during drilling when synthetic fluids are used. This formula
is a hyper-concentrated microemulsion surfactant system, and is a highly effi-
cient and environment-friendly organic solvent replacement, which is also
nontoxic and biodegradable.

6.4.2.2.2 Preparation of Efficient and Degradable Oily Cutting
This formula adopts many surfactants, depending on the synergy between dif-
ferent surfactants while washing. In order to determine the proportion of every
surfactant, the weighted average of HLB value of every surfactant is calculated,
to make sure that the HLB value is within 13 16, and the optimum formula
is selected by combining the degradation rate, as shown in Table 6.20.
Based on the above formula, a more efficient and degradable degreaser was
developed, as shown as Fig. 6.23.

6.4.2.2.3 Analysis of Efficient and Degradable Degreaser
The following degreasers without gas-wetting alteration agents are analyzed in
series.
1. Elemental analysis
An elemental analyzer is used for analyzing the degradable degreaser,
as shown in Table 6.21. From Table 6.21, it can be seen that the main
elements of this degradable degreaser are C, H, O, S, and a small
amount of K and N. S comes from the sulfonic acid group of