Page 7 - Sami Franssila Introduction to Microfabrication

vi Contents

3 Simulation of Microfabrication Processes 27
3.1 Types of simulation 27
3.2 1D simulation 28
3.3 2D simulation 29
3.4 3D simulation 30
3.5 Exercises 31
References and related readings 32

PART II: MATERIALS 33

4 Silicon 35
4.1 Silicon material properties 35
4.2 Silicon crystal growth 36
4.3 Silicon crystal structure 39
4.4 Silicon wafering process 40
4.5 Defects and non-idealities in silicon crystals 43
4.6 Exercises 44
References and related readings 45

5 Thin-Film Materials and Processes 47
5.1 Thin films versus bulk materials 47
5.2 Physical vapour deposition (PVD) 49
5.3 Evaporation and molecular beam epitaxy 49
5.4 Sputtering 50
5.5 Chemical vapour deposition (CVD) 51
5.6 Other deposition technologies 53
5.7 Metallic thin films 56
5.8 Dielectric thin films 58
5.9 Properties of dielectric films 59
5.10 Polysilicon 62
5.11 Silicides 63
5.12 Exercises 64
References and related readings 64

6 Epitaxy 65
6.1 Heteroepitaxy 66
6.2 CVD homoepitaxy of silicon 67
6.3 Simulation of epitaxy 69
6.4 Advanced applications of epitaxy 70
6.5 Exercises 70
References and related readings 71

7 Thin-film Growth and Structure 73
7.1 General features of thin-film processes 73
7.2 PVD-film growth and structure 74
7.3 CVD-film growth and structure 77
7.4 Surfaces and interfaces 79
7.5 Adhesion layers and barriers 81
7.6 Multilayer films 82
7.7 Stresses 83