Page 9 - Sami Franssila Introduction to Microfabrication

viii Contents

12.3 Particle contamination 136
12.4 Organic contamination 138
12.5 Metal contamination 138
12.6 Rinsing and drying 140
12.7 Physical cleaning 140
12.8 Exercises 141
Suggested further reading 141

13 Thermal Oxidation 143
13.1 Oxidation process 143
13.2 Deal–grove oxidation model 143
13.3 Oxide structure 145
13.4 Simulation of oxidation 146
13.5 Local oxidation of silicon (LOCOS) 147
13.6 Stress and pattern effects in oxidation 148
13.7 Exercises 150
References and related readings 150

14 Diffusion 153
14.1 Diffusion mechanisms 154
14.2 Doping profiles in diffusion 155
14.3 Simulation of diffusion 156
14.4 Diffusion applications 157
14.5 Exercises 158
References and related readings 158

15 Ion Implantation 159
15.1 The implant process 159
15.2 Implant damage and damage annealing 161
15.3 Ion implantation simulation 162
15.4 Tools for ion implantation 162
15.5 SIMOX: SOI by ion implantation 164
15.6 Exercises 164
References and related readings 164

16 CMP: Chemical–Mechanical Polishing 165
16.1 CMP process and tool 165
16.2 Mechanics of CMP 167
16.3 Chemistry of CMP 168
16.4 Applications of CMP 169
16.5 CMP control measurements 170
16.6 Non-idealities in CMP 170
16.7 Exercises 171
References and related readings 172

17 Bonding and Layer Transfer 173
17.1 Silicon fusion bonding 174
17.2 Anodic bonding 176
17.3 Other bonding techniques 177