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                   356                       MEMS and Microstructures in Aerospace Applications



                   TABLE 16.1
                   Screening Procedure for Hermetic MEMS Adapted from MIL-PRF-38535 —
                   Continued

                   Screen                         MIL-STD-883, Test Method (TM) and Condition
                   11. Final electrical test   In accordance with device specification
                      a) Static test at þ258C,
                        maximum and minimum
                        rated operating temperature
                      b) Dynamic or functional
                        tests at þ258C, maximum and
                        minimum rated operating
                        temperature
                      c) Switching tests at þ258C,
                        maximum and minimum rated
                        operating temperature
                   12. Seal                    TM 1014 Seal (fine and gross leak) testing. Fine and gross
                      a) Fine                   leak seal tests shall be performed, as specified between
                      b) Gross                  temperature cycling and final electrical testing after all
                                                shearing and forming operations on the terminals.
                   13. External visual         TM 2009





                   For critical space applications, burn-in times may be extended especially for
                   qualification. Other tests that may be required and are found in MIL-STD-883
                   include destructive physical analysis (die related), residual gas analysis (package
                   related), and radiation tests.

                   16.3.3 PACKAGING AND HANDLING
                   Packaging is sometimes an overlooked detail, but in fact, is one of the most difficult
                   and expensive aspects of MEMS. MEMS devices contain exposed moving parts that
                   can be made nonfunctional or unreliable by the presence of liquid, vapor, gases,
                   particles, or other contaminants. Unlike a standard integrated circuit, it is not
                   possible to clean a MEMS device once it has been released. For this reason, the
                   MEMS wafers must be singulated (cut up into individual die) and assembled before
                   they are released if possible. After the die release, they must be protected from
                   particulates and contamination. Dust from machines or people making contact with
                   active areas or regions can impede movement of a MEMS device, or affect the
                   electrostatic fields that govern its motion.
                       Package cleanliness acceptable for a standard integrated circuit is a reliability
                   concern for a MEMS device, again because particles and contamination that do not
                   affect operation of an IC interact with the microelectromechanical device. The
                   package environment, including such issues as outgassing of die attach, presence of
                   particles, moisture levels, chemical interactions with antistiction coatings, assembly
                   temperature, and other issues all must be evaluated and addressed in the quality and

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