Page 254 - Microsensors, MEMS and Smart Devices - Gardner Varadhan and Awadelkarim
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234    MICROSENSORS
























                 200         300         400          500         600
                                    Temperature, T(°K)
   Figure 8.6  Temperature-dependence  of  single-crystal  silicon  doped  at  various  levels  (n-type).
   From  Wolf  (1969)

   types  of  device.  Therefore,  the  preferred  approaches  are  to  make  a  microthermocouple
   out  of  silicon  or, better  still, use the inherent temperature sensitivity of a silicon diode  or
   transistor.
     The  Seebeck  coefficient  of  single-crystal  silicon  varies  with  both  temperature  and
   doping concentration (p-type)  as  shown in Figure 8.7. Doping has  the effect  of reducing
   the  temperature  variation  of  the  coefficient  itself; hence,  the  response  of a  silicon-based
   thermocouple  becomes more  linear.  As a variety  of doping  levels  are possible in a planar
   IC process, a Seebeck coefficient ranging from  +0.5 to  +5  mV/°C is  achievable.
     In  theory,  the  Seebeck coefficient of a  doped  semiconductor  is given by


                n-type:  />„_* = -  — {[ln(N c/n) + 2.5] + (1 + 5,) + $„
                                q
                                                                         (8.5)
                p-type:  P p_ Si  = ~{[\n(N v/p)  + 2.5]  s p)  +  <t> p}

   where  k B  is the Boltzmann's constant, q  is the  carrier  charge,  N c  and  N v  are the density
   of  states  at  the  bottom  of  the  conductance  band  and  top  of  the  valence  band,  n  and  p
   are the donor  and acceptor  concentrations,  s  is a parameter  related  to the  mean free  time
   between  collisions  and  the  charge  carrier  energy  and  its  value  varies  between  —1 and
   +2  depending  on  whether  the  carriers  can  move  freely  or  are  trapped,  and  finally  <j> is
   a  phonon  drag  term  for  the  carrier.  In  practice,  the  Seebeck  coefficient  can  be  readily
   estimated  from  the  silicon  resistivity  rather  than the  carrier  concentrations  and  is simply
   given  by
                                             p
                                           In  —                         (8.6)
                                             PQ
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