Page 107 - Nanotechnology an introduction
P. 107

ambient relative humidity. Although not atomically precise manufacturing, it allows features of the order of 100 nm to be written, and may be
  considered as featuring an approximately eutactic environment.
  DPN was presumably inspired by printed electronic devices. Circuits can be fabricated at extremely low cost by printing onto a suitable substrate.
  Conventional  processes  such  as  screen  printing  and  inkjet  are  suitable,  with  inks  formulated  using  “pigments”  that  are  conductive  or
  semiconductive nanoparticles. This technology is especially attractive for radio frequency identification tags (RFID), which are expected to become
  widely used in packaging, and as security devices on products and even on documentsif they can be produced at sufficiently low cost.
  8.4. Summary

  Top–down  methods  (exemplified  by  ultraprecision  engineering  and  semiconductor  processing)  constitute  the  bulk  of  current  industrial
  nanotechnology. Due to the enormous expense of the capital equipment required, however, it is impractical for use other than for very high volume
  products (such as computer or cellular phone chips) or very unique products for which a high price is affordable (giant astronomical telescopes;
  long-range spacecraft).
  The “real” vision of nanotechnology (especially associated with Feynman and Drexler) is based on mechanosynthesis (chemistry with positional
  control), possibly facilitated by using pre-constructed nanoblocks as the elementary units of fabrication. A productive nanosystem is based on
  assemblers, devices that are themselves in the nanoscale, hence the method is also known as bottom-to-bottom. Because of their minute size, the
  only practical way to fabricate large or large quantities of entities is for the assemblers to first assemble copies of themselves, which then all work
  in  parallel.  The  practical  realization  of  this  vision  is  focused  on  tip-based  methods  inspired  by  the  scanning  probe  instruments  used  in
  nanometrology; at present single objects comprising of the order of ten atoms can be made in this way.

  Originally inspired by biology, a third approach is based on creating objects (which could be nanoblocks) capable of spontaneously assembling
  into useful structures. This method is known as bottom–up or self-assembly and has been quite successful at creating regular structures (e.g.,
  nanoporous membranes for separating vapors) but the creation of arbitrary geometries requires programmable self-assembly. In other words
  bottom–up is good at creating materials but not for creating devices. Biological nano-objects have this ability, but it is extraordinarily difficult to
  reverse-engineer them and use the knowledge to create synthetic analogs.

  These  three  methods  can  sometimes  be  advantageously  combined;  for  example,  self-assembly  could  be  used  to  make  a  mask  for
  photolithography more cheaply and quickly than electron beam writing, which is then used in top–down fabrication (e.g., to create superhydrophobic
  surfaces).
  8.5 Further Reading
  Castleman Jr., A.W.; Khanna, S.N., Clusters, superatoms and building blocks of new materials, J. Phys. Chem. C 113 (2009) 2664–2675.
  Frauenfelder, H., From atoms to biomolecules, Helv. Phys. Acta 57 (1984) 165–187.
  Kellenberger, E., Assembly in biological systems, In: Polymerization in Biological SystemsCIBA Foundation Symposium 7 (new series). (1972)
      Elsevier, Amsterdam, pp. 189–206.
  Mamalis, A.G.; Markopoulos, A.; Manolakos, D.E., Micro and nanoprocessing techniques and applications, Nanotechnol. Percept. 1 (2005)
      63–73.
  Merkle, R.C., Molecular building blocks and development strategies for molecular nanotechnology, Nanotechnology 11 (2000) 89–99.
  Schaaf, P.; Voegel, J.-C.; Senger, B., Irreversible deposition/adsorption processes on solid surfaces, Ann. Phys. 23 (1998) 3–89.
  Hall, J. Storrs, Architectural considerations for self-replicating manufacturing systems, Nanotechnology 10 (1999) 323–330.
   102   103   104   105   106   107   108   109   110   111   112