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Manufacturing Issues



          338  Chapter Twenty


                               Sintered glass  SiO 2 powder (soot)

                      Reactant
                       gases                              Exhaust




                            Fused silica tube
                                                   Moving torch

                      Figure 20.4. Illustration of the modified chemical vapor
                      deposition (MCVD) process.


                      upward and rotating it continuously to maintain a cylindrical symmetry of the
                      particle deposition. As the porous preform moves upward, it is transformed into
                      a solid transparent glass rod preform by a ring heater.


          20.1.3. Modified chemical vapor deposition
                      The modified chemical vapor deposition (MCVD) process shown in Fig. 20.4 was
                      pioneered at Bell Laboratories and has been adopted widely elsewhere. In this
                      technique, metal halide gases and oxygen flow through the inside of a revolving
                      silica tube. As the SiO 2 particles are deposited, they are sintered to a clear glass
                      layer by an oxyhydrogen torch which travels back and forth along the tube.
                      When the desired thickness of glass has been deposited, the vapor flow is shut
                      off and the tube is strongly heated to cause it to collapse into a solid rod pre-
                      form. The fiber that is drawn from this preform rod will have a core that con-
                      sists of the vapor-deposited material and a cladding that consists of the original
                      silica tube.

          20.1.4. Plasma-activated chemical vapor deposition
                      The plasma-activated chemical vapor deposition (PCVD) process is similar to
                      the MCVD method in that deposition occurs within a silica tube. However, a
                      moving microwave plasma operating at low pressure initiates the chemical reac-
                      tion within the tube. This process deposits clear glass material directly on the
                      tube wall without going through a soot deposition step. Thus, no extra sinter-
                      ing step is required. Just as in the MCVD case, when the desired thickness of
                      glass has been deposited, the vapor flow is shut off and the tube is strongly
                      heated to cause it to collapse into a solid rod preform.

          20.2. Component Designs

                      Significant cost reductions and enhanced performance are two key factors for
                      component design related to the growing use of dense WDM systems. These are
                      great challenges, since performance improvement often leads to more expensive


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