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46 Chapter One

10. D. J. Gundlach, Y. Y. Lin, T. N. Jackson, S. F. Nelson, and D. G. Schlom, IEEE
Electron Dev. Lett., 18(3):87–88 (1997).
11. Zhenan Bao, Ananth Dodabalapur, and Andrew J. Lovinger, Appl. Phys. Lett.,
69(26):4108 (1996).
12. H. Sirringhaus, N. Tessler, and Richard H. Friend, Science, 280:1741 (1998).
13. Jürgen Krumm, Elke Eckert, Wolfram H. Glauert, Andreas Ullmann, Walter
Fix, and Wolfgang Clemens, IEEE Electron Dev. Lett., 25(6):399 (June 2004).
14. A. Brown, R. A. Pomp, C. M. Hart, and D. M. de Leeuw, Science, 270:972 (1995);
A. R. Brown, A. Pomp, D. M. de Leew, D. B. M. Klaassen, E. E. Havinga, P. T.
Herwig, and K. Muellen, J. Appl. Phys., 79:2136 (1996).
15. A. Afzali, C. D. Dimitrakopoulos, and T. L. Breen, JACS, 124(30):8812–8813
(2002).
16. Steven K. Volkman, Steven Molesa, Brian Mattis, Paul C. Chang, and Vivek
Subramanian, Mat. Res. Soc. Symp. Proc., 769, H11.7.1/L12.7.1, 2003.
17. N. Karl, J. Marktanner, R. Stehle, and W. Warta, Synth. Met. 42:2473 (1991).
18. W. Warta, R. Stehle, and N. Karl, Appl. Phys. A: Solids Surf. A36:163 (1985).
19. T. Holstein, Ann. Phys. (N.Y.), 8:325 (1959).
20. D. Emin, Phys. Rev. B, 4:3639 (1971).
21. D. Emin, Phys. Rev. Lett., 25:1751 (1970).
22. R. M. Glaser and R. S. Berry, J. Chem. Phys., 44:3797 (1966).
23. S. Jeyadev and E. M. Conwell, Phys. Rev. B, 35(12):6253 (1987).
24. E. M. Conwell, H.-Y. Choi, and S. Jeyadev. Synth. Met., 49–50:359–365 (1992).
25. S. Jeyadev and J. R. Schrieffer. Phys. Rev. B, 30:3620 (1984).
26. A. Salleo, T. W. Chen, A. R. Volkel, Y. Wu, P. Liu, B. S. Ong, and R. A. Street,
Phys. Rev. B, 70:115311 (2004).
27. R. A. Street, J. E. Northrup, and A. Salleo, Phys. Rev. B, 71:165202 (2005).
28. Gilles Horowitz, Riadh Hajlaoui, and Philippe Delannoy, J. Phys. III Fance,
5:355–371 (1995).
29. Christopher R. Newman, Reid J. Chesterfield, Jeffrey A. Merlo, and C. Daniel
Frisbie, Appl. Phys. Lett., 85(3):422 (2004).
30. D. Knipp, R. A. Street, and A. R. Volkel, Appl. Phys. Lett., 82(22):3907 (2003).
31. A. Dodabalapur, L. Torsi, and H. E. Katz, Science, 268(5208):270–271 (1995).
32. C. D. Dimitrakopoulos and P. R. L. Malenfant, Adv. Mater., 14:99 (2002).
33. Y. M. Sun, Y. Q. Liu, and D. B. Zhu, J. Mater. Chem., 15(1):53–65 (2005).
34. Hagen Klauk, Marcus Halik, Ute Zschieschang, Gunter Schmid, Wolfgang
Radlik, and Werner Weber, J. Appl. Phys., 92(9):5259 (2002).
35. Yuanjua Zhang, Jason R. Patta, Santha Ambily, Yulong Shen, Daniel C. Ralph,
and George G. Malliaras, Adv. Mater., 15(19):1632 (2003).
36. C. D. Dimitrakopoulos, S. Purushothaman, J. Kymissis, A. Callegari, and J. M.
Shaw, Science, 283:822 (1999).
37. J. Collet, O. Tharaud, A. Chapoton, and D. Vuillaume, Appl. Phys. Lett.,
76(14):1941 (2000).
38. Yuanjua Zhang, Jason R. Patta, Santha Ambily, Yulong Shen, Daniel C. Ralph,
and George G. Malliaras, Adv. Mater., 15(19):1632 (2003); M. Leufgen, U. Bass,
T. Muck, T. Borzenko, G. Schmidt, J. Geurts, V. Wagner, et al., Synth. Met.,
146:341–345 (2004).
39. Ch. Pannemann, T. Diekmann, and U. Hilleringmann, Microelectronic Engg.,
67–68:845–852 (2003); Michael D. Ausin and Stephen Y. Chou, Appl. Phys. Lett.,
81(23):4431–4433 (2002).
40. Liang Wang, Daniel Fine, Taeho Jung, Debarshi Basu, Heinz von Seggern, and
Ananth Dodabalapur, Appl. Phys. Lett., 85(10):1772 (2004); Josephine B. Lee,
Paul Chang, J. Alex Liddle, and Vivek Subramanian, IEEE Trans. Electron Dev.,
52(8):1874–1879 (Aug. 2005).
41. Gilles Horowitz, Riadh Hajlaoui, and Philippe Delannoy, J. Phys. III Fance,
5:355–371 (1995); Gilles Horowitz, Mohsen E. Hajlaoui, and Riadh Hajlaoui,
J. Appl. Phys., 87(9):4456–4463 (2000).
42. S. F. Nelson, Y.-Y. Lin, D. J. Gundlach, and T. N. Jackson, Appl. Phys. Lett.,
72(15):1854–1856 (1998).
43. Eric L. Granstrom and C. Daniel Frisbie, J. Phys. Chem. B, 103:8842–8849 (1999);
Anna B. Chwang and C. Daniel Frisbie, J. Phys. Chem. B, 104:12202 (2000).