Page 95 - Process simulation and control using Aspen
P. 95
ASPEN PLUS SIMUIATION OF REACTOR MODELS 87
iViirtiT.r
433
1 n-i 1.1 nr - .i ,ieii i mi *m
i; i
71
am*. | CJk-<| [(on
'
CI.X'6 > wi [1
. 1
1
.
J _i5Lj
jjWM REaJ gg»] HCs flt f nawct f
FIGURE 2.49
Hit A exf knob and obtain two stoichiometric relations as shown in Figure 2.50.
-
y. To* An fV Lirwy (fntjrw Mai
.
DMBI 1
-i-nr .1 w - i
3>>J qLJniJ
-
HmNo Stuctimttry
: Kn«c
_ j MHnnd
, I Sehdt I Ui*M«Jrt )
1 r §
*
,.
u E .11 c
61 bio's ' fif.ioc ff/ id he j* new- ftCMn flrv Rn»th
c v e (BiiTffiirr ft* n-i " "
FIGURE 2.50
we use partial pressure basis (applicable
In the simulation of the present problem, form:
therefore, the Power law expression has the following
for vapour o nly) and ,
n 1
( f > E ri
r = k exp (2.5)
R To ,
where , P represents the partial pressure (N/m2). Iffo is not specified, the above equation
18 re placed by:
