Page 265 - Semiconductor Manufacturing Handbook

Geng(SMH)_CH18.qxd 04/04/2005 19:58 Page 18.6

WET CLEANING

Foup Loadport

Wafer handling module Wafer handling robot

To chemical exhaust scrubber Exhaust Process vessel Drain valve Drain to chemical waste

Deionized water valve Chemical valve Flowmeter Recirc. valve Heater

Wet cleaning system boundary Chemical handling module Chemical storage tank Filter Pump Return pump Generic design for wet cleaning equipment.

Deionized water FIGURE 18.2

18.6
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