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Polymers, Photoresponsive 741

The intense industry interest in 157-nm lithography has 18. Feit, E. D., Thompson, L. F., and Heidenreich, R. D. (1973). ACS
catalyzed activity in designing ultrathin resists that would Div. Org. Coat. Plast. Chem. Preprint, 383.
most probably be based on fluoropolymers and/or siloxane 19. Taniguchi, Y., Hatano, Y., Shiraishi, H., Horigome, S., Nonogoki,
S., and Naraoka, K. (1979). Jpn. J. Appl. Phys. 28, 1143.
chemistries. Such lithography also poses yet another chal-
20. Tan, Z. C., Petropolous, C. C., and Rauner, F. J. (1981). J. Vac.
lenge to the resist community and is the topic of intense Sci. Technol. 19(4), 1348.
research. 21. Novembre, A. E., and Bowden, M. J. (1983). Polym. Eng. Sci. 23,
977.
22. Tabata, Y., Tagawa, S., and Washio, M. (1984). In “Materials
SEE ALSO THE FOLLOWING ARTICLES for Microlithography” (L. F. Thompson, C. G. Willson, and
J. M. J. Frechet, eds.), p. 161, ACS Sympsoium Series 266, ACS,
Washington, D.C.
INTEGRATED CIRCUIT MANUFACTURE • PHOTOCHEM- 23. Hartney, M. A., Tarascon, R. G., and Novembre, A. E. (1985). J.
ISTRY,MOLECULAR • POLYMERS,MECHANICAL BEHAV- Vac. Sci. Technol. B3, 360.
IOR • THIN FILM TRANSISTORS 24. Imamura, S. (1979). J. Electrochem. Soc. 126(9), 1268.
25. Choong, H. S., and Kahn, F. J. (1981). J. Vac. Sci. Technol. 19(4),
1121.
26. Feit, E. D., Thompson, L. F., Wilkins, C. W., Jr., Wurtz, M. E.,
BIBLIOGRAPHY
Doerries, E. M., and Stillwagon, L. E. (1979). J. Vac. Sci. Technol.
16(6), 1287.
1. Bardeen, J., and Brattain, W. H. ( 1948). Phys. Rev. 74(2), 230. 27. Imamura, S., and Sugawara, S. (1982). J. Appl. Phys. 21, 776.
2. Thompson, L. F., Willson, C. G., and Bowden, M. J. (1994). “Intro- 28. Yoshioka, N., Suzuki, Y., and Yamazaki, T. (1985). Proc. SPIE
duction to Microlithography,” ACS Professional Reference Book, 537, 51.
Washington, D.C. 29. Thompson, L. F., and Doerries, E. M. (1979). J. Electrochem. Soc.
3. McCoy, J. H., Lee, W., and Varnell, G. L. (1989). Solid State Tech- 126(10), 1699.
nol. 32(3), 87. 30. Thompson, L. F., Yau, L., and Doerries, E. M. (1979). J.
4. Takigawa, T. (1992). Photopolymer Sci. Technol. 5(1), 1; DeJule, Electrochem. Soc. 126(10), 1703.
R. (1998). Semiconductor Int. 21(2), 54; Dejule, R. (1999). 22(3), 31. Novembre, A. E., Masakowski, L. M., and Hartney, M. A. (1986).
48; McClay, J. A., and McIntyre, S. L. (1999). Solid State Technol. Poly. Eng. Sci. 26(6), 1158.
42(6), 57. 32. Hatzakis, M., Paraszczak, J., and Shaw, J. M. (1981). In “Micro-
5. Reichmanis, E., and Thompson, L. F. (1989). In “Polymers in Mi- circuit Eng. 81” (A. Oosenburg, ed.), pp. 386–396, Swiss Fed.
crolithography: Materials and Processes,” ACS Symposium Series Inst. Technol., Lausanne.
412 (E. Reichmanis, S. A. MacDonald, and T. Iwayanagi, eds.), 33. MacDonald, S. A., Steinman, F., Ito, H., Lee, W.-Y., and Willson,
pp. 1–24, ACS, Washington, D.C. C. G. (1983). Preprints. ACS Div. Polymeric Materials: Sci. Eng.
6. Thompson, L. F. (1994). In “Introduction to Microlithography,” 50, 104.
pp. 269–375, ACS Professional Reference Book, Washington, D.C. 34. Suzuki, M., Saigo, K., Gokan, H., and Ohnishi, Y. (1983). J.
7. Reichmanis, E., and Thompson, L. F. (1989). Chem. Rev. 89, 1273. Electrochem. Soc. 130, 1962.
8. Moreau, W. M. (1988). “Seimconductor Lithography; Principles, 35. Novembre, A. E., Jurek, M. J., Kornblit, A., and Reichmanis, E.
Practices, and Materials,” Plenum, New York. (1989). Polym. Eng. Sci. 23, 920.
9. Reiser, A. (1989). “Photoreactive Polymers: The Science and Tech- 36. Ranby, B., and Rabek, J. F. (1975). “Photodegradation, Photoox-
nology of Resists,” John Wiley & Sons, New York, pp. 22–65. idation and Photostabilization of Polymers,” John Wiley & Sons,
10. Reichmanis, E., and Neenan, T. X. (1998). In “Chemistry of Ad- New York, pp. 15–159.
vanced Materials: An Overview” (L. V. Interrante, and M. J. 37. Hatzakis, M. (1969). J. Electrochem. Soc. 116, 1033.
Hampden-Smith, eds.), pp. 99–141, Wiley-VCH, New York. 38. Mimura, Y., Ohkubo, T., Takanichi, T., and Sekikawa, K. (1978).
11. Iwayanagi, T., Kohashi, T., Nonogaki, S., Matsuzawa, T., Douta, Jpn. Appl. Phys. 17, 541.
K., and Yanazawa, H. (1981). IEEE Trans. Elec. Dev. Ed. 28(11), 39. Lin, B. (1975). J. Vac. Sci. Technol. 12, 1317.
1305–1310. 40. Helbert, J. N., Chen, C. Y., Pittman, C. U., Jr., and Hagnauer, G. L.
12. Nonogaki, S., Hashimoto, H., Iwayanagi, T., and Shiraishi, H. (1978). Macromolecules 11, 1104; Lai, J. H., Helbert, J. N., Cook,
(1985). Proc. SPIE 529, 189. C. F., Jr., and Pittman, C. U., Jr. (1979). J. Vac. Sci. Technol. 16(6),
13. Hoshimoto, H., Iwayanagi, T., Shiraishi, H., and Nonogoaki, S. 1992; Helbert, J. N., Wagner, B. E., Caplan, J. P., and Poindexter,
(1985). “Proc. Regional Technical Conference on Photopolymers,” E. H. (1975). J. Appl. Poly. Sci. 19, 1201; Chen, C. Y., Pittman, C.
Mid-Hudson Section SPE, Ellenville, NY, p. 11. U., Jr., and Helbert, J. N. (1980). J. Poly. Sci. Poly Chem. Ed. 18,
14. Heriott, D. R., Collier, R. J., Alles, D. S., and Stafford, J. W. (1975). 169.
IEEE Trans. Electron. Devices ED-22, 385. 41. Moreau, W. M. (1982). Proc. SPIE 333, 2.
15. Thompson, L. F., and Kerwin, R. E. (1976). Ann. Rev. Materials 42. Kakuchi, M., Sugawara, S., Murase, K., and Matsuyama, K. (1977).
Sci. (R. A. Huggins, R. H. Bube, and R. W. Roberts, eds.), 6, 267– J. Electrochem. Soc. 224, 1648; Tada, T. (1979). J. Electrochem.
301. Soc. 126, 1829; Tada, T. (1983). J. Electrochem. Soc. 130, 912.
16. Tagawa, S. (1987). In “Polymers for High Technology: Electronics 43. Roberts, E. D. (1977). ACS Div. Org. Coat. Plastics Chem.
and Photonics,” ACS Symposium Series 346 (L. F. Thompson, Preprints 37(2), 36; Moreau, W., Merritt, D., Moyer, W., Hatzakis,
C. G. Willson, and J. M. Frechet, eds.), pp. 37–45, ACS M., Johnson, D., and Pederson, L. (1979). J. Vac. Sci. Technol.
Washington, D.C. 16(6), 1989; Namaste, Y. M. N., Obendorf, S. K., Anderson, C. C.,
17. Hirai, T., Hatano, Y., and Nonogaki, S. (1971). J. Electrochem. Krasicky, P. D., Rodriguez, F., and Tiberio, R. (1983). J. Vac. Sci.
Soc. 118(4), 669. Technol. B 1(4), 1160.