Page 132 - High Power Laser Handbook
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102    Diode Lasers                                                                                                      Semiconductor Laser Diodes    103


                      direct-diode sources, where they are replacing traditional laser techno-
                      logies, such as flash lamp–pumped or diode-pumped solid-state lasers
                      and carbon dioxide (CO ) gas lasers.
                                          2
                         This chapter introduces the key attributes of the semiconductor
                      laser diode to form the backdrop to its ubiquity. Although an over-
                      view  of  the  physical  mechanism  of  lasing  in  semiconductors  is
                      briefly presented, it is not the focus of this work. The wafer fabrica-
                      tion  processes  used  to  create  the  semiconductor  laser  chip  are
                      described,  and  the  key  processes  that  enable  high-power  laser
                      performance  are  noted.  State-of-the-art  performance  values  for
                      single-emitter lasers, both single spatial mode and multiple mode,
                      are detailed. Understanding these values at the single-emitter level
                      allows understanding of their scaling to one-dimensional and two-
                      dimensional  laser  arrays,  which  are  respectively  known  as  laser
                      “bars” and “stacks” and which are covered in Chap. 6. Basic single-
                      emitter assembly concepts, fiber-coupled packaging, and reliability
                      metrics and methods are also presented here.




                 5.2  Historical Growth of Power
                      The birth of the modern semiconductor laser took place in 1963 with
                      two independent proposals for the double heterostructure laser design
                                                                1
                      from Alferov and Kazarinov and from Kroemer.  Advances in two
                      epitaxial  growth  techniques  in  the  1970s—molecular  beam  epitaxy
                      (MBE) and metal organic chemical vapor deposition (MOCVD)—were
                      important enabling technologies that allowed the creation of tightly
                      controlled layer thickness and atomic composition, which are needed
                      to grow quantum well (QW) active layers and which have the associ-
                      ated benefits of gain and reduction in threshold current. Significant
                      commercialization of high-power laser diodes started in 1983, with
                                                     2
                      the formation of Spectra Diode Labs.  The literature provides several
                      excellent reviews of these early days. 1-3
                         Continuous  improvements  in  crystal  growth  technologies  and
                      the purity of materials sources drove improvements in the 1980s and
                      1990s. Advancements over the past 10 years have been driven by fur-
                      ther refinements in laser design, which are focused on increased effi-
                      ciency, improved facet passivation technology, robust die attach, and
                      advanced heat sinking. As shown in Fig. 5.1, the past 17 years have
                      seen steady growth in the reliable optical output power of commer-
                      cial products. Both multimode and single-mode laser diode powers
                      have increased by about 15 percent per annum. This growth rate is
                      likely a function of increased investment in the required technolo-
                      gies. During the dot-com and telecom frenzy of the late 1990s, the
                      advancement in 980-nm single-mode power increased to double the
                      historic rate.
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