Page 68 - High Power Laser Handbook
P. 68

40    G a s , C h e m i c a l , a n d F r e e - E l e c t r o n L a s e r s                                                           Excimer Lasers     41


                         Second-generation superconductor bands are built from a multi-
                      layer structure. The base is a stainless steel band that takes the mechan-
                      ical forces onto which the multiple functional layers are deposited.
                      The  cerium  oxide  (CeO )  buffer  layer  and  the  superconducting
                                           2
                      YBaCuO  layer  are  typically  produced  by  pulsed  laser  deposition
                                                   16
                      (PLD) with 308-nm excimer lasers.  Within a vacuum chamber, the
                      excimer laser ablates small portions from the target material (i.e., the
                      YBaCuO) with each pulse. From the resulting plasma plume, a directed
                      transfer of the target material is achieved, which is then deposited on
                      the substrate. Tight control of the laser conditions leads to optimum
                      ablation and a uniform deposition of the thin film.
                         The  application  range  of  high-power  excimer  lasers  is  steadily
                      increasing, as driven by the industry trends toward miniaturization and
                      cost-effective processing, including the elimination of wet chemistry.
                      The excimer laser technology demanded by various applications and
                      industries has been developed to a very mature stage. Future require-
                      ments of even higher power levels, in excess of 1 kW, and of further cost
                      reductions in the laser process are the driving forces behind advancing
                      excimer laser technology and paving the way for new opportunities.

                 References

                        1.  Basov, N. G., et al.: “Laser Operating in the Vacuum Region of the Spectrum
                          by Excitation of Liquid Xenon with an Electron Beam,” J. Exp. Theor. Phys. Lett.,
                          12(S. 329), 1970.
                        2.  Rhodes, C. D.: Excimer Lasers—Topics in Applied Physics, Vol. 30, 2nd ed., Berlin,
                          Springer-Verlag, 1984.
                        3.  Basting, D., and Marowsky, G.: Excimer Laser Technology, Berlin, Springer-
                          Verlag, 2005.
                        4.  Borisov V., et al.: “Conditions for the excitation of a wide-aperture XeCl
                          laser with an average output radiation power of 1 kW,” Quantum Electronics,
                          25: 408, 1995.
                        5.  Godard, B., et al.: “First 1-kW XeCl Laser,” Proc. CLEO 93, Baltimore, MD,
                          1993.
                        6.  Yoshino, M., et al.: “High-Power and High-Energy Stability Injection Lock
                          Laser Light Source for Double Exposure or Double Patterning ArF Immersion
                          Lithography,” Optical Microlithography XXI, eds. H. J. Levinson and M. V.
                          Dusa, SPIE, Bellingham, WA, 2008.
                        7.  Fleurov, V., et al.: “XLR 600i: Recirculating Ring ArF Light Source for Double
                          Patterning  Immersion  Lithography,”  Optical  Microlithography  XXI,  eds.
                          H. J. Levinson and M. V. Dusa, SPIE, Bellingham, WA, 2008.
                        8.  Trokel, S. L., Srinivasan, R., and Braren, B.: “Excimer laser surgery of the
                          cornea,” Am. J. Ophthalmol., 96: 710–715, 1983.
                        9.  Srinivasan,  R.,  et  al.:  “Mechanism  of  the  Ultraviolet  Laser  Ablation  of
                          Polymethyl Methacrylate at 193 and 248 nm: Laser-Induced Fluorescence
                          Analysis, Chemical Analysis, and Doping Studies,” J. Opt. Soc. Am., 3: 785–791,
                          1986.
                      10.  Herman, P. R., et al.: “VUV Holographic Gratings Etched by a Single F  Laser
                                                                           2
                         Pulse,” OSA Conference on Lasers and Electro-Optics, Anaheim, CA, 1994.
                      11.  Stamm, U., et al.: “Novel Results of Laser Precision Microfabrication with
                         Excimer Lasers and Solid State Lasers,” 1st International. Symposium on Laser
                         Precision Microfabrication, SOIE, Omiya, Saitama, Japan, 2000.
                      12.  Paetzel, R.: “UV-Micromachining by Excimer Laser,” ICALEO, 2005.
   63   64   65   66   67   68   69   70   71   72   73