Page 228 - Inorganic Mass Spectrometry - Fundamentals and Applications
P. 228

Seconda~ Ion  Mass  Spectrometry                              21 3


            lo5 I
                                                  l












                      l      l      l      I
               0     300    600  900     1200   1500
                             Depth, nm
                   Depth  profile  on  uranium  sample  exposed  sequentially  to   "OH,,  180H,,
         %H,,  "*OH,, 160H,, for 6 hr each  at 80°C and 0.6 @a.  See  text.  (From  Ref. 143.)


         posed to vacancy migration (i,e., the slope of the *60" signal  between  the  first  and
         second  layers is the  same  as  that  between  the  third  and  fourth  layers).  Vacancy  mi-
         gration  would  involve  the  permanent  oxide  positions  and  broaden the interfaces
         with  time. The deuterium  isotope in the water of the second  exposure  shows that
         the  oxygen is traveling  with  deuterium  (or  hydrogen)  through  the lattice probably
         as OD (or  OH). The deuterium is a  trapped  species  that  exchanges  very little [i.e.,
         little change is seen  after  a  third  exposure to ISOH, (Fig.  4.44b)I. The profiles  in
         Fig.  4.44  and  4.45  also show  that  the  oxygen  isotope from  the  last  exposure  is
         higher t~oughout the  oxide. The  change in l80 in  the l60 oxide layer is very  rapid.
         Using  a  series of short  exposures, the half-life for exchange  between  the  migrat-
         ing  species  and  the  gas  phase  was  measured  as  6 rnin  at 80°C. At  21°C the half-
         life was  -125  rnin.  These  experiments  also  showed  that the rate-limiting step for
                                                          is
         the oxidation  process is the  reaction  at  the  metal  interface  and not  due  to  the  dif-
         fusion rate of rnigrating species, Although the migration is rapid, the migrating
         species  could  not be removed  in  vacuum  or  by  exposure to a  strong  desiccant at
         80°C. Thus  the  migrating  species is not  likely OH,.
              Before  this  study  was  done, it was  known  that the presence of oxygen in-
                                                         it
         hibited  the  reaction  between  water  and  uranium.  However, was  incorrectly  as-
         sumed  (and  mathematically  inferred)  from  weight  gain  studies  that  the  mechanism
         for the i~ibition was the formation of a  monolayer of adsorbed or chemisorbed
         oxygen  atoms  on  the  oxide  surface  that  served to block the adsorption of  water
         molecules  [144]. The SIMS profiles  in  Fig.  4.44b  made after the final  exposure to
         l80H, clearly  show  that the l80 migrating  species  has  traveled  to the metal  sur-
         face without  inhibition,  and  additional  reaction  with the metal  has  not  occurred  to
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