Page 82 - Inorganic Mass Spectrometry : Fundamentals and Applications
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72                                                         Olesik


            Second,  the  sample is isolated, to a  large  degree, from the  doughnut  region of the
            plasma  where  most of the energy is coupled. As a result, the  energy  coupling is not
            strongly  dependent on the composition of the sample (in  contrast to a  discharge
            between  two electrodes, for example).  Gas  velocities  in the center of the plasma
            are  typically  15 to 20 dsec [8]. The plasma  may be about 20 to 30 mm  long before
            ions  are  sampled into the mass  spectrometer,  so the  sample  spends l to 2 msec  in
            the plasma.
                                                                          for
                 The radio  frequency  plasma  power  supply  must  be  designed  specifically
            ICP-MS.  Radio  frequencies  between 27 and 40 MHz  are  typically  used for ICP
            generation.  During ignition, the  impedance of the  plasma  varies  dramatically  from
            nearly  infinite  to nearly  zero.  The plasma  impedance  is also a  function  of  the
            applied  power,  gas  flow  rates,  solvent  loading  (the  amount solvent  aerosol  and
                                                           of
            vapor  entering  the plasma  per  second), and  plasma  gas  composition.  ICP-MS
            signals are very  sensitive  to  small changes  (more  than  about  1%) in  power  so
            power  fluctuations  and  drift  must  be  minimal.  Finally,  the  plasma  potential,
            dependent  on  the  power  supply  and  load   coil configuration,  must  be  properly
            controlled.  If  the  plasma  potential too high relative to the  sampling  plate of the
                                       is
            mass  spectrometer,  a  secondary rf discharge  or  arc  forms. The electric field  can
            also propagate  along the ion  beam into the interface region  between the sampling
            orifice  and  skimmer, so that  a  discharge  forms  in  this  region.
                 The presence of  a  strong  secondary  discharge  has  several deleterious ef-
            fects. The sampling  orifice  can be slowly  vaporized  by  the  arc.  This leads to  a
            higher  background for the elements that make  up  the  sampling  cone  and  a  reduced
            lifetime of  the  sampling  cone.  Formation  of  doubly  charged  ions  (]Sa2+,   for
            example,  because  barium  has  a  relatively  low  second  ionization  energy,  10 eV,
            compared  to other elements) is more likely, although  molecular  oxides  might  be
            more  effectively  atomized.  The ion  kinetic  energy  and  spread   of  ion  kinetic
            energies  are  larger,  thus  reducing the resolution  and  abundant  sensitivity (ratio of
            signal at the  mass of an  ion  to that one mass  unit  away,  produced by ions of the
            same  mass)  provided  by  quadrupole  mass  spectrometers.
                 Several different  approaches  have  been  used  to minimize  formation of  a
            secondary  discharge,  which  results  from  parasitic  capacitance  between plasma
                                                                    the
            and  the  load coil. A balanced  load coil can  be  used  where  the  two  ends of a single
            load coil are  driven by  rf signals of opposite  phase  but  nearly equal amplitude [g]
            (as is  done  on Perkin  ElmerlSciex  ins~ments, called  PlasmaLok).  Then  the
            center of the load coil is at 0 V.  In some  cases  the  center of the load coil can be
            directly  connected  to  ground or to the sampling  plate of the mass  spectrometer.
            ~lte~atively~ two  separate  load coils can  be  interlaced to form  a  balanced  rf drive
            system (as is done on Varian  instruments).
                 A grounded, electrical shield  can be placed  between the load coil and  torch
            to reduce the capacitive  coupling  between the load coil and  the  plasma  in  order to
            reduce  the  plasma  potential  [lo]. A thin  metal  cylinder,  split  along its length (to
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