Page 358 - System on Package_ Miniaturization of the Entire System

Comments n at 1550 nm n at 630 nm n at 1550 nm n at 850 nm n at 1300 nm

o C or sublimation 250–400

Tg 300 400 200 200 250 400 150

n (632 nm) 1.575 1.491–1.543 1.474–1.528 1.45–1.55 1.510 1.4440– 1.5823 1.444–1.4545 1.45–1.58

1550 nm 0.48 0.4 0.5 1.9 0.4 0.5

1300 nm 0.22 0.24 1.4 0.110 0.14 0.2 0.4

850 nm 0.1 0.05 0.1 0.06 0.015 0.04

Process RIE, UV UV UV UV UV UV UV RIE UV,

Epoxy novolak resin Inorganic polymer Epoxy siloxane

Material glass (IPG) oligomer EPOXY Siloxane Siloxane Siloxane (TiO 2 doped) Polycyanurate True Mode (acrylate)

Supplier MicroChem RPO Pty. Ltd. Acton, Australia Polyset NTT Dow Corning Shipley / Rohm&Haas Kyocera Corporation Fraunhofer IZM TeraHertz Exxelis (Continued)

TABLE 6.1
Ref. T15 T16, T17 T18 T19 T20 T21 T22 T23 T24

330