Page 254 - MEMS Mechanical Sensors
P. 254

9.8 Flow Imaging                                                              243

                              Sensing resistor
                                                           0.4     Opening angle = 70º
                                                                   Opening angle = 110º
                                                          [Hz]  0.3
                                                          frequency  0.2

                             Fluid flow
                                                          Flapping  0.1


                                              Opening      0.0
                                              angle
                                                              0.0  1.0   2.0   3.0  4.0
                                                                     Velocity [mm/s]
                                     (a)                                  (b)
                  Figure 9.35  (a) Schematic drawing of the sensor structure. The opening of the nozzle is 360 µm,
                  the height of the structure is 48 µm, and the distance from nozzle to plate is around 2.8 mm. (b)
                  Graph showing the flapping frequency versus the flow velocity. (After: [103].)




                  flapping motion. The flapping frequency for flow velocities of up to 4 mm/s was
                  below 0.2 Hz with water as the test fluid [Figure 9.35(b)].
                      As an explanation for the flapping motion, Lee et al. [103] say that a larger pres-
                  sure field may be developed with the presence of the V-shaped plate, and therefore,
                  the impinging jet column interacts with the pressure wave propagating upstream,
                  resulting in a periodic flapping motion. The authors propose the required work to
                  investigate why the flapping motion occurs at those low Reynolds numbers (0.2 to
                  5.4 for this device). Data for the sensor is given in Table 9.12.
                      Another interesting aspect is that the sensor was manufactured in commercially
                  available quartz photomask plates with unpatterned chromium and resist, normally
                  used for electron-beam mask writing. The resist was patterned by standard photo-
                  lithography using a film generated from a high-resolution laser plotter (10,000
                  dot/inch). Subsequently the chromium and quartz were etched. The quartz plate is
                  bonded to another quartz plate (on which the resistors were patterned in the chro-
                  mium) at 50°C for 8 hours with an intermediate layer of sodium silicate solution
                  (SiO :NaOH). However, this is only a cheap fabrication option if there is no metal
                      2
                  evaporator available, as the photomask plates are rather expensive compared to
                  quartz wafers.



            9.8   Flow Imaging

                  Various methods for flow imaging have been proposed and are described in this
                  section. The flow imaging can be used for measuring the fluid flow velocity or to
                  take snapshots of the fluid flow to visualize flow profiles or eddies. With some


            Table 9.12  Data for Flow Sensor Based on Periodic Flapping Motion
            Author; Year         Flow Range    Sensitivity  Response Time  Fluid  Chip Size
            Lee et al. [103]; 2002  >0.15 mm/s  —         —            Water    3 × 6mm 2
   249   250   251   252   253   254   255   256   257   258   259