Page 428 - Microsensors, MEMS and Smart Devices - Gardner Varadhan and Awadelkarim
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408    MEMS-IDT MICROSENSORS





















                     Figure  14.7  Measurement  of  the  (Sj 2) parameter

     trough  is  1 \im  deep.  Within  this  trough,  600  nm  of  aluminum  was  deposited.  This
     device  allows  the conductor  to be  placed  400  nm from  the  substrate.
   2.  This  sample  is  the  same  as  the  one  discussed  earlier,  except  that  there  is  a  silicon
     dioxide  layer  1 um  thick  on  the  substrate.  This  sample  allows  the  conductor  to  be
     placed  1.4 um from  the  substrate.
   3.  The  third  sample  is  similar  to  the  first  sample.  It consists  of  a  micromachined  trough
     that  is  1 um  deep.  Silicon  is  to  serve  as  a  conductor.  This  sample  can  be  used  to
     evaluate  the  suitability of  silicon  as a conductor  for  this  application.

  These  samples  are shown  in  Figure  14.8.  These  samples  are  flipped  over  and  are  placed
  on the  substrate.  They  rest on spacers.  The  spacers  lie outside  the propagation  path of the
  Rayleigh wave. The trough was big enough such that when it was placed  on the  substrate,
  it  still  left  the  substrate  mechanically  free.  This  can  be  easily  tested  by  doing  the  S\2
  measurement  (Figure  14.7).  These  observations  were  carried  out  in  both  the frequency
  and  the time  domain.
     The  following conclusions  have  been  derived  from  the  set  of  experiments  mentioned
  previously.  The  arrangement  of  the  spacer  performs  adequately  in  the  placing  of  the
  conductor  within  one  wavelength  of  the  surface.  Silicon  instead  of  aluminum  could  be
  used  for  this device.  For  this  application,  it can  almost  be  considered  to  be  a  conductor.
  The perturbation  in the  velocity  of  the  wave is too  small  to be  measured  as a  shift  in the
  amplitude  response  in  both  frequency  and  time  domain  with  the  given  resolution  of  the
  network  analyser.



  14.4.5  Fabrication of Seismic Mass

  Following  the  aforementioned  evaluation of the performance  of the  IDT microsensor,  we
  will now discuss the addition  of a seismic mass to the wafer to produce  an accelerometer.
  The fabrication of a seismic  mass  is a two mask  process. Here,  the  masks  were  designed
  for  the  process using  the  commercial  software  package of  L-Edit  (Tanner Tools  Inc.). A
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