Page 285 - Book Hosokawa Nanoparticle Technology Handbook

FUNDAMENTALS CH. 4 CONTROL OF NANOSTRUCTURE OF MATERIALS

Spherical integration
of particles

Si substrate
OTS-SAM
Water (20 l) Immersion into Piezo Water’s gradual
Silica (1 m ) hexane (20ml) Supersonic dissolution into
Substrate 10mm *10 mm treatment (1 min) hexane

Figure 4.6.15
Preparation of spherical particle collectives made by two-solution method.

Additionally, since the whole process is conducted As seen in Fig. 4.6.14(e), the particles on the edge of
completely in a liquid phase, it is possible to add other the particle assembled layer pattern are arranged in a
chemical reactions easily to this reaction system. This straight line with an accuracy less than a few hundreds
process can realize multi-layer particle collective pat- of nanometers showing high patterning precision. The
terns in an arbitrary shape, double-layer particle pat- centers of the individual particles are positioned in a
tern, and mono-layer particle pattern (Fig. 4.6.14) [20]. regular arrangement with an accuracy of less than a

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