Page 284 - Book Hosokawa Nanoparticle Technology Handbook

4.6 SELF-ASSEMBLY FUNDAMENTALS

OTS Silanol group OTS Silanol group OTS
Silicon substrate
52°
Substrate
Methanol droplet on
OTS in the atmosphere
130° Proposal of method which has advantages
Hexane of both solution process and drying process.

Substrate
Utilize liquid-liquid interface which is
Methanol droplet on Contraction of colloid solution mold formed between two hardly mixable
OTS in hexane
solvents, methanol and hexane
Patterning by solvent mold (template)

Making fcc (hcp) structure and closest
packing by contraction of solvent

Figure 4.6.13
Particle collective patterning made by two-solution method.

Figure 4.6.14
Particle collective patterns prepared by two-solution method. (a, b) Multi-layer particle collective patterns; (c, d) Double-
layer particle patterns; (e–g) Mono-layer particle patterns.

In the stage of further solution of methanol, the occurring in these processes and the meniscus force at
methanol forms a bridge between adjacent particles at the last stage of drying accelerate the preparation of
the interface between the methanol and the decalin, fcc (hcp) construction and closest packing of the
which causes a meniscus force attracting the particles particles and form the particle collectives along the
to each other. The contraction of colloid solution hydrophilic patterning on the board.

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