Page 15 - Principles and Applications of NanoMEMS Physics
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Chapter 1

             NANOELECTROMECHANICAL SYSTEMS













             1. 1 NanoMEMS Origins

                 The field of Nanotechnology, which aims at exploiting advances in the
             fabrication  and controlled  manipulation  of nanoscale  objects, is attracting
             worldwide attention. This attention is predicated upon the fact that obtaining
             early  supremacy  in this  field of miniaturization may well be  the key  to
                                                st
             dominating the world economy of the 21  century and beyond. NanoMEMS
             exploits   the    convergence    between    nanotechnology    and
             microelectromechanical systems (MEMS) brought about by advances in the
             ability to  fabricate nanometer-scale  electronic and mechanical  device
             structures. Indeed,  the impact of  our  ability  to make and control  objects
             possessing dimensions down to atomic scales, perhaps first  considered  by
             the late Richard Feynman in his 1959 talk “There is Plenty of Room at the
             Bottom” is expected to be astounding [1], [2]. In particular, miniaturization,
             he insinuated, has the potential to fuel radical paradigm shifts encompassing
             virtually all areas of science and technology, thus giving rise to an unlimited
             amount of technical applications. Since high technology fuels the prosperity
             of the world’s most developed nations, it is easy to see why the stakes are so
             high.
                 Progress in the field of miniaturization benefited from the advent of the
             semiconductor industry in the 1960s, and its race to increase profits through
             the  downscaling  of  circuit dimensions which, consequently, increased  the
             density  and the yield  of circuits  fabricated  on a given  wafer  area.  This
             density, which derived from progress in photolithographic tools to produce
             the ever smaller two-dimensional patterns (device layouts) of an integrated
             circuit (IC), has increased since by more than seven orders of magnitude and
             has come to be captured by Moore’s law: The number of components per
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