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10     CHAPTER 1 Solar Cells and Arrays: Principles, Analysis, and Design
















                         FIGURE 1.6
                         The illustration of energy gap E g and energy level diagram.

                         2.2 DOPING AND CONDUCTIVITY OF THE MATERIAL

                         One of the main properties of the semiconductors is the possibility to alter their elec-
                         trical characteristics by doping. Doping is intentional addition of specific impurities
                         to the material to produce n-type or p-type conductors and change the electron and
                         hole concentration in the material. To produce n-type Si, we add pentavalent impu-
                         rity atoms to Si such as P and As, whereas for p-type Si, we add trivalent atoms such
                         as B, Ga, and Al to Si. The charge picture after doping is illustrated in Fig. 1.7.
                            The product of the concentration p o and n o of any semiconductor at temperature
                                                      2
                         T are given by the relation n o p o ¼ n , which is called the mass action law. The con-
                                                      i
                         ductivity of the semiconductor material can be, generally, expressed by
                                                                                        (1.1)
                                                  s ¼ qm n o þ qm p o
                                                        n
                                                                p
                         where q is the electron charge; m n is the electron mobility; and m p is the hole
                         mobility. So, the conductivity of the n-type material is
                                                  s n z qm n o ¼ qm N D                (1.2a)
                                                                n
                                                        n
                         and that of the p-type material is
                                                  s p z qm p o ¼ qm N A                (1.2b)
                                                                p
                                                        p













                         FIGURE 1.7
                         Charge picture after doping the semiconductor silicon.
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