Page 235 - An Introduction to Microelectromechanical Systems Engineering
P. 235

214                                        MEM Structures and Systems in RF Applications

                 a smaller size and lower bill-of-materials cost than if a separate hermetic package
                 were used.
                    The gap between the cantilever and the underlying electrodes must be suffi-
                 ciently large that the isolation is high when open. Furthermore, the cantilever must
                 be stiff enough that it is not damaged and closure does not accidentally occur when
                 the device is shocked (switches have demonstrated a shock tolerance of 30,000G).
                 These criteria lead to a higher actuation voltage than is available in many systems.
                 To resolve this problem, charge-pump circuitry supplies the needed drive voltage
                 from a 1.5-V input. When closed, which takes 10 µs, the measured insertion loss of
                 the switch is less than 0.2 dB from dc to 2 GHz. For the package alone, the insertion
                 loss is nearly “invisible” to the circuit at 0.06 dB, which has enabled this packaging
                 scheme to be used for other RF devices as well as switches. The isolation when open
                 is 40 dB. Goals are an insertion loss of 0.2 dB over 24–40 GHz, a lifetime of 10 11
                 cycles, and 1-W cold-switched power handling.



          Summary


                 The most notable members of the RF MEMS family, micromachined variable
                 capacitors, inductors, resonators, filters, and switches were described, with research
                 or commercial examples of each. There are different advantages of these devices,
                 compared to their conventional counterparts, including smaller size, lower cost,
                 higher Q, lower loss, and the ability to be integrated on the same chip as circuitry. A
                 common theme in RF MEMS is the reduction of parasites. We are presently at the
                 dawn of an era of commercial use of RF MEMS.



          References

                 [1]  Ramo, S., J. R. Whinnery, and T. van Duzer, Fields and Waves in Communications Elec-
                     tronics, 3rd ed., New York: John Wiley, 1994.
                 [2]  Solymar, L., and D. Walsh, Lectures on the Electrical Properties of Materials, 3rd ed.,
                     Oxford, United Kingdom: Oxford Univeristy Press, 1985.
                 [3]  Nguyen, C. T. -C., L. P. B. Katehi, and G. M. Rebeiz, “Micromachined Devices for Wireless
                     Communications,” Proceedings of the IEEE, Vol. 86, No. 8, August 1998, pp. 1756–1786.
                 [4]  Young, D. J., et al., “A Low-Noise RF Voltage-Controlled Oscillator Using On-Chip
                     High-Q Three-Dimensional Inductor and Micromachined Variable Capacitor,” Technical
                     Digest of Solid-State Sensor and Actuator Workshop, Hilton Head, NC, June 1998, pp.
                     128–131.
                 [5]  Young, D. J., and B. E. Boser, “A Micromachined Variable Capacitor for Monolithic Low-
                     Noise VCOs,” Technical Digest of Solid-State Sensor and Actuator Workshop, Hilton
                     Head, SC, June 1996, pp. 86–89.
                 [6]  Dec, A., and K. Suyama, “Microwave MEMS-Based Voltage-Controlled Oscillators,” IEEE
                     Transactions on Microwave Theory and Techniques, Vol. 48, No. 11, November 2000,
                     pp. 1943–1949.
                 [7]  U.S. Patent 6,549,394, April 15, 2003.
                 [8]  Dec, A., and K. Suyama, “Micromachined Electro-Mechanically Tunable Capacitors and
                     Their Application to IC’s,” IEEE Transactions on Microwave Theory and Techniques, Vol.
                     46, No. 12, December 1998, pp. 2587–2596.
   230   231   232   233   234   235   236   237   238   239   240