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Radio Fr equency System-on-Package (RF SOP)   279




                                                            Via


                                  Au (2 μm)



                         Polyimide

                          Ground
                           plane
                                                         Au (1 μm)

                                          Si Substrate (625 μm, ρ = 30 cm)

                    FIGURE 5.18  An example of inductors on Si substrate. [34]


                    observed at a frequency of 13.6 GHz and an SRF of 24.7 GHz. A high-speed complementary
                    bipolar process has also been used to build inductors with a Q of over 12 for use in
                    wireless applications [35]. In this example, 16 square inductors were built on a test array
                    with outer dimensions of 300 μm. A spacing of 4 μm was used for each inductor. An
                    oxidized porous silicon layer of 25 μm thickness was used on an SiO  substrate to obtain
                                                                            2
                    a high-performance planar inductor [36]. A Q of 13.3 was obtained for a 6.29-nH inductor
                    with a self-resonant frequency of 13.8 GHz. Instead of direct oxidization of bulk silicon,
                    the oxidation process of porous silicon was used to make the thick oxide layer.
                       A quality factor of up to 30 and self-resonant frequency higher than 10 GHz was
                    obtained when polysilicon spiral inductors encapsulated with copper were suspended
                    over 30-μm-deep cavities in the silicon substrate beneath [37]. The metallization process
                    simultaneously coated the inner surfaces of the cavities with copper to form a good
                    radiofrequency ground and an electromagnetic shield.
                       To achieve cost and size reductions, low-cost manufacturing technologies for RF
                    inductors were developed by utilizing a passive integration process using copper
                    metallization with benzocyclobutene (BCB) interlayer dielectric [38]. In this example, a
                    10-μm-thick copper plating process for low-loss inductor fabrication and interconnections
                    was used. The fabricated inductor library showed a maximum quality factor in the
                    range of 30 to 120 and inductance values in the range of 0.35 to 31.5 nH around 4 GHz.
                       Most inductors fabricated on organic substrates are designed as onboard components
                    [39–40]. The majority of these structures have been designed as either microstrip or
                    coplanar lines, each with its own set of advantages and limitations. The microstrip
                    configuration provides good power handling capability and low dispersion. However,
                    inductors require vias to provide connection to the ground plane. These vias, not only
                    add process steps, but also introduce process variations and parasitics. Coplanar
                    waveguide structures on the other hand, make it easier to add shunt and series elements
                    as compared to their microstrip counterparts.
                       As discussed above, LCP is a very attractive material as a high-frequency circuit
                    substrate due to its ultralow loss and low dielectric constant over a high-frequency
                    range, near hermetic sealing as a result of superior moisture barrier properties, flexible
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