Page 258 - Sami Franssila Introduction to Microfabrication
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24




                                   Process Integration








           Process integration is the task of putting together individ-  Design rules:
           ual process steps to create functional devices. This neces-
           sitates interfacing device design and processing, knowl-  • What is the minimum width allowed for lines?
           edge of process capability and device operation, under-  • How closely can you place structures?
           standing materials interactions and being prepared for  • How much area should be allowed for misalign-
           equipment limitations – all aspects of microfabrication.  ment tolerances?
             Process integration is about questions such as
           the following:                              Mask considerations:

           Wafer selection:                            • Which photomasks are critical, which are non-
                                                         critical?
           • Should n-type or p-type wafers be used?   • Does etch undercutting need to be compensated on
           • Can epitaxial or SOI wafers contribute to device  the mask?
             performance?                              • How much area should be reserved for test chips and
           • Are mechanical wafer specifications important, or  how much for device chips?
             electrical, or both?
                                                       Order of process steps:
           Materials compatibility:
                                                       • Does the stress relief anneal affect structures already
                                                         fabricated?
           • Are the interfaces stable at process temperatures?
           • Will the thermal expansion coefficient mismatches  • Can any steps be done after thin membrane formation?
             create stresses?                          • Should front-side processing be completed before
           • Do the metals withstand the wet cleaning solutions?  backside processing?
                                                       Reliability:
           Process-device interactions:
                                                       • Do current densities in wiring need to be limited?
           • How do thermal treatments add to diffusion profiles?  • How do stresses build up when more layers are
           • Is etch profile critical?                    deposited?
           • How does lithographic linewidth variation affect
                                                       • What is the breakdown voltage of thin oxides?
             device performance?
           Equipment and process capability:           24.1 PROCESS INTEGRATION ASPECTS
                                                       OF A SOLAR-CELL PROCESS
           • How much of the underlayer is lost during overetching?
           • What is the step coverage of sputtered films in  The simple solar-cell process described in Figure 24.1
             contact holes?                            features some important interactions between pro-
           • Can thick stacks of bonded wafers be inserted  cess steps that arise when complete processes are
             into tools?                               put together.

           Introduction to Microfabrication  Sami Franssila
            2004 John Wiley & Sons, Ltd  ISBNs: 0-470-85105-8 (HB); 0-470-85106-6 (PB)
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