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LIGA and Micromolding                                                                       4-9


             TABLE 4.3 Facilities in the United States Where Access to Synchrotron Radiation Is or Will Soon Be Available

             Facility                                    Institute                      URL
             Advanced Photon Source (APS)     Argonne National Laboratory   http://www.aps.anl.gov/
             Cornell High Energy Synchrotron  Cornell University            http://www.tn.cornell.edu/
               Source (CHESS)
             National Synchrotron Light       Brookhaven National Laboratory  http://www.nsls.bnl.gov/
               Source (NSLS)
             Stanford Synchrotron Radiation   Stanford University           http://www-ssrl.slac.stanford.edu/
               Laboratory (SSRL)
             Synchrotron Ultraviolet Radiation  National Institute of Standards  http://physics.nist.gov/MajResFac/SURF/
               Facility (SURF)                  and Technology
             Synchrotron Radiation Center (SRC)  University of Wisconsin-Madison  http://www.src.wisc.edu/
             Center for Advanced Microstructures  Louisiana State University  http://www.camd.lsu.edu/
               and Devices (CAMD)
             Advanced Light Source (ALS)      Lawrence Berkeley Laboratory  http://www-als.lbl.gov/



             wavelengths shorter than 1nm, Be is very transparent — that is, it is an excellent X-ray window. A 25µm
             thick Be window can withstand a 1atm pressure differential across a small diameter ( 1 in). For large
             area exposures, windows up to 6cm dia. have been developed. Be windows age with X-ray exposure and
             must be replaced periodically.


             4.2.3 Access to the Technology

             Today, the construction cost for a typical synchrotron totals over $30 million, restricting the access to
             LIGA. Obviously, a less expensive alternative for generating intense X-rays is preferred. Along this line, in
             Japan Ishikawajima–Harima Heavy Industries (IHI) is building compact synchrotron X-ray sources (e.g.,
             an 800MeV synchrotron of about 30 feet per side) ( http://www.ihi.co.jp/ ).
               By the end of 1993, eight nonprivately owned synchrotrons were in use in the United States. The first
             privately owned synchrotron was put into service in 1991 at IBM’s Advanced Semiconductor Technology
             Center (ASTC) in East Fishkill, New York. Table 4.3 lists the eight U.S. synchrotron facilities.
               Most  of the  facilities  listed  in  Table  4.3  allow  LIGA  work. For example, Cronos Integrated
             Microsystems, Inc., a JDS Uniphase Company and a spin-off from MCNC (Research Triangle Park, NC),
             in collaboration with the University of Wisconsin-Madison, announced its first multiuser LIGA process
             sponsored by ARPA in September 1993 ( http://www.memsrus.com/CIMSmain2ie.html ). The Center
             for Advanced Microstructure Devices (CAMD), at Louisiana State University, has three beam lines dedi-
             cated exclusively to micromachining work, and the Advanced Light Source (ALS) at Berkeley has one
             beam line available for micromachining.
               Like Cronos, Forschungszentrum Karlsruhe GmbH offers a multiuser LIGA service (LEMA, or LIGA-
             experiment for multiple applications). The commercial exploitation of LIGA is pursued by at least three
             German  organizations: microParts  GmbH  STEAG  ( http://www.microparts.de ); IMM  ( http://www.
             imm.uni-mainz.de ); and Forschungszentrum Karlsruhe, or  KfK  ( http://www.fzk.de ). In  the  U.S.,
             Louisiana State University’s CAMD ( http://www.camd.lsu.edu/ ), Baton Rouge, and the associated
             start-up Mezzo Systems, Inc. (now International Mezzo Technologies, Inc.,  http://www.mezzotech. biz/ ),
             are promoting the technology.


             4.3 LIGA and LIGA-Like Process Steps

             4.3.1 X-Ray Masks


             4.3.1.1 Introduction
             X-ray mask production is one of the most difficult aspects of X-ray lithography. To be highly transmis-
             sive to X-rays, the mask substrate by necessity must be a low-Z (atomic number) thin membrane. X-ray



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