Page 184 - Materials Science and Engineering An Introduction
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156   •  Chapter 5  /  Diffusion

                                the background concentration of that impurity in the silicon (C B ) (Figure 5.10). For
                                drive-in diffusion x j  may be computed using the following expression:
                                                                              1/2
                                                                     Q 0
                                                   x j = c (4D d  t d )ln a  b d                   (5.13)
                                                                  C B 1pD d  t d
                                Here, D d  and t d  represent, respectively, the diffusion coefficient and time for the drive-in
                                treatment.


                       EXAMPLE PROBLEM 5.6
                         Diffusion of Boron into Silicon

                         Boron atoms are to be diffused into a silicon wafer using both predeposition and drive-in heat
                                                                                                     20
                         treatments; the background concentration of B in this silicon material is known to be 1   10
                                3
                         atoms/m . The predeposition treatment is to be conducted at 900 C for 30 min; the surface con-
                                                                                      3
                         centration of B is to be maintained at a constant level of 3   10  atoms/m . Drive-in diffusion
                                                                             26
                         will be carried out at 1100 C for a period of 2 h. For the diffusion coefficient of B in Si, values
                                                              3
                                                                 2
                         of Q d  and D 0  are 3.87 eV/atom and 2.4   10  m /s, respectively.
                        (a)  Calculate the value of Q 0 .
                        (b)  Determine the value of x j  for the drive-in diffusion treatment.
                        (c)   Also for the drive-in treatment, compute the concentration of B atoms at a position 1 
m
                            below the surface of the silicon wafer.
                         Solution
                        (a)  The value of Q 0  is calculated using Equation 5.12. However, before this is possible, it is
                            first necessary to determine the value of D for the predeposition treatment [D p  at T   T p
                            900 C (1173 K)] using Equation 5.8. (Note: For the gas constant R in Equation 5.8, we use
                                                                                   #
                                                                          5
                            Boltzmann’s constant k, which has a value of 8.62   10  eV/atom K). Thus,
                                                  Q d
                                      D p = D 0   expa -  b
                                                  kT p
                                                                      3.87 eV/atom
                                                 -3  2
                                        = (2.4 * 10  m /s) exp c -              #         d
                                                                      -5
                                                             (8.62 * 10  eV/atom  K)(1173 K)
                                                      2
                                        = 5.73 * 10 -20  m /s
                            The value of Q 0  may be determined as follows:
                                             D p t p
                                     Q 0 = 2C s
                                           B p
                                                                          2
                                                             (5.73 * 10 -20  m /s)(30 min)(60 s/min)
                                                 26
                                                         3
                                       = (2)(3 * 10  atoms/m )
                                                           B                p
                                                18
                                       = 3.44 * 10  atoms/m 2
                        (b)   Computation of the junction depth requires that we use Equation 5.13. However, before
                            this is possible, it is necessary to calculate D at the temperature of the drive-in treatment
                            [D d  at 1100 C (1373 K)]. Thus,
                                                                      3.87 eV/atom
                                                  -3  2
                                      D d = (2.4 * 10  m /s)expc -              #         d
                                                                      -5
                                                             (8.62 * 10  eV/atom K)(1373 K)
                                                      2
                                         = 1.51 * 10 -17  m /s
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