Page 277 - Book Hosokawa Nanoparticle Technology Handbook
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FUNDAMENTALS                                           CH. 4 CONTROL OF NANOSTRUCTURE OF MATERIALS

                                Nanostructure of                        Structure of
                                suspensions     Coating and drying process  Thin films  Applications

                                                Surface modification
                                                Substrate treatment                Memory media



                                                                                   Optical device of
                                                   Coating & Drying
                                                                                   nanoparticles

                                                   Rheology
                                                                                   Anti-reflection
                                                   viscosity


                                                                                   Nano-composite
                                                         Shear rate

                  Figure 4.6.1
                  Thin film structures desired for various applications.


                  determined by a surface potential on substrates is
                  self-assembly. For example, the pattern formations
                  due to the combination of both hydrophilic and   order
                  hydrophobic characteristics and also due to positive
                  and negative electric potentials are classified as self-
                  assembly. On the other hand, the pattern formation       Self-assembly       Self-organization
                  under uniform surface potentials is due to self-organ-
                  ization. The difference of self-ordering between self-
                  assembly and self-organization on the same substrate
                  is due to the dependency on surface potentials. As a
                  result, the pattern of nanoparticles generated on the
                  latent pattern of surface potentials of a substrate is  disorder
                  due to self-assembly. On the other hand, the pattern    Nonequilibrium (super saturation)
                  formation due to self-organization is controlled by
                  particle–particle interactions and transport properties  Figure 4.6.2
                  such as the diffusion of nanoparticles and the viscos-  Schematic characteristics of self-assembly and
                  ity of suspensions. Furthermore, the structure forma-  self-organization.
                  tion due to self-organization, which is a rate process
                  under non-equilibrium, depends on both the process
                  time and the relaxation time of nanoparticles struc-  2. Self-ordering modeling under drying process
                  tures. For instance, the complicated structure forma-  The mechanism of self-ordering [8] in colloidal sys-
                  tion of nanoparticles in coating and drying process is  tem can be explained by self-organization of
                  mainly determined by the balance between drying  nanoparticles during drying.  The colloidal system
                  time and particle diffusion time. The drying time is a  during drying on a substrate is schematically shown
                  sort of quenching time to fix the structure of  in Fig. 4.6.3. The nanoparticles in solvent reach the
                  nanoparticles. The fast quenching rate results in dis-  substrate with the decreasing thickness of liquid film
                  order structures of nanoparticles. The transition from  during drying. The ordering of nanoparticles takes
                  disorder to order is a function of the degree of non-  place just before the dry up of solvent, because of the
                  equilibrium. The relationship is schematically shown  capillary force, the attractive force, due to the change
                  in Fig. 4.6.2.  The structure formation due to self-  of the free surface shown in the middle of Fig. 4.6.3.
                  organization is not well-understood because of high  The fcc ordering shown in the bottom of Fig. 4.6.3
                  non-equilibrium and strong non-linearity.      can be observed [9–14]. Here, we explain the

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