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APPLICATIONS                                                 2 GENERATION OF METAL NANOPARTICLES
                  for advanced printed boards with thin conductive  [5] Arakawa Chemical Industries Ltd., Patent,  WO01-
                  layers and flat interfaces.                        05862, EP1123944, CN1318077T,  TW483907,
                                                                     US6506868.
                                                                 [6] H. Goda: J. Jpn. Soc. Colour Mater., 77 (2), 69 (2004).
                                   References
                                                                 [7] H. Goda: Polym. Prepr. Jpn., 50, 2688 (2001).
                   [1] B.C. Novak: Adv. Mater., 5 (6), 422 (1993).  [8] H. Goda, C.W. Frank:  Chem. Mater.,  13  (7), 2783
                   [2] Y. Chujo, T. Saegusa: Adv. Ploym. Sci., 100, 11 (1992).  (2001).
                   [3] G.L. Wilkes, B. Orler and H.H. Haung: Polym. Prep.,  [9] H. Goda: Kobunshi Ronbunshu, 59, 596 (2002).
                      26 (2), 300 (1985).                        [10] H. Goda, M. Mesaki:  Polym. Prepr. Jpn.,  51, 2245
                   [4] S.  Yamazaki: Polyurethane–Silica hybrid,  Technical  (2002).
                      Report of National Institute for Material Science,  [11] H. Goda, T. Fujiwara: Expected Mater. Future, 3, 34
                      Japan, 4, 41 (1996).                           (2003).



                            APPLICATION 2

                    2       GENERATION OF METAL NANOPARTICLES USING REACTIVE PLASMA
                            ARC EVAPORATION



                  1. Summary of the reactive plasma arc evaporation   Tungsten electrode     H
                                                                                              2
                  method                                                (Cathode)       (Non arc gas phase)
                  (1) Features of the reactive plasma arc evaporation             H  Nanoparticles
                  method                                            Plasma arc
                  The reactive plasma arc evaporation method has been  (Arc gas phase)  Hydrogen atom
                  developed by M. Uda et al., of the National Research  Metal evaporation
                  Institute for Metals, in the late of 1970’s, and which is
                  classified as one of plasma heating methods.  The                       H gas and metal evaporation
                                                                                           2
                  plasma heating methods are technique to obtain  Dissolved H
                  nanoparticles by metal plasma evaporation.              2       H        High H content region
                    A gas evaporation method which has been devel-             Molten metal     2
                  oped previously must be conducted under several               Anode
                  hundreds to thousands Pa of argon (Ar) or helium
                  (He) atmosphere for nanoparticle synthesis [1].  Figure 2.1
                    On the other hand, the reactive plasma arc evapora-
                  tion method can be under atmospheric pressure of  Schematic diagram of the nanoparticles generation
                                                                 mechanism under H gas atmosphere.
                  diatomic molecular gas such as nitrogen (N ) and             2
                                                        2
                  hydrogen (H ). These gases greatly influenced on the
                            2
                  nanoparticle generation mechanism.
                  (2) Nanoparticle generation mechanism          the molten metal. The metal evaporation condenses
                  Fig. 2.1 shows a schematic diagram of the nanoparti-  and nanoparticles are obtained [3].
                  cle generation mechanism under H gas atmosphere  H gas can catalyze during metal nanoparticles gen-
                                                                    2
                                               2
                  [2]. According to M. Uda et al., the mechanism is as  eration from molten metal under H arc plasma.
                                                                                             2
                  follows: diatomic molecular gases dissociate to single
                  atoms in the arc plasma, and then these atoms dis-  (3) Outline of the metal nanoparticle generation device
                  solve in the molten metal.                     Fig. 2.2 shows the outline drawing of the metal nanopar-
                    The transfer of these atoms to supersaturated area  ticle generation device with the reactive plasma arc
                  in the molten metal caused by convection flow. The  evaporation method.
                  atoms rebond and be discharged. At the same time,  Bulk as a starting material is placed on the water-
                  lots of excited metals evaporate from the surface of  cooled copper hearth, the bulk is irradiated with the


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