Page 91 - Organic Electronics in Sensors and Biotechnology
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68    Cha pte r  T w o

                   The devices were tested as p-channel materials with an Agilent
               4155 C semiconductor parameter analyzer kept in a glove box at room
               temperature. The field-effect mobilities in saturation regimes were
               extracted using the well-known equation 59
                                                2
                          I = C μ (W/2L) (V − V )  at  V  > V        (2.2)
                           ds   i          g   t      ds  g
               where I = drain-source current
                      ds
                     C = capacitance per unit area of the gate dielectric layer
                       i
                     V = gate voltage
                      g
                     V = threshold voltage
                       t
                                                  1/2
               Voltage V  was extrapolated from the (I )  vs. V  plot.
                        t                       ds      g
                                                  −3
                                                      2
                   Channel mobilities as high as 1.6 × 10  cm /(V⋅ s) with an on/off
                           4
               ratio of 2 × 10  were reached with a bottom-contact geometry. These
               figures were slightly improved by annealing the substrate film for
                                                             2
                                                         −3
               30 min at 100°C, resulting in a mobility of 2.8 × 10  cm /(V⋅ s) and an
               on/off ratio of 6 × 10 . Postthermal annealing treatments have been
                                 4
               known to improve molecular ordering and grain sizes of the thin film
               and frequently result in better device performance. Moreover, anneal-
               ing may reduce also the concentration of adsorbed impurity dopants
               (moisture and oxygen), increasing the OTFT properties. 128–130
                   Field-effect mobility greater than one order of magnitude was
               achieved for spin-coated and annealed top-contact OTFT. Top-
               contact devices were fabricated using a highly n-doped silicon wafer
               (resistivity 20 Ω ⋅ cm) as gate contact on which 100 nm of dielectric
               (SiO ) was thermally grown. Gold was used as the source and drain
                   2
               electrodes, and it was deposited on organic active layer through a
               shadow mask with a channel width (W) of 500, 1000, 2000, and 4000 μm
               and a channel length of 150, 100, 100, and 200 μm, respectively.
                   Figure 2.5a shows the current–voltage characteristics (I  vs. V )at
                                                                ds   ds
               different gate bias for top-contact devices of an active channel having
               W/L = 500/150 (μm/μm). Figure 2.5b shows I  and I  1/2  vs. V  transfer
                                                     ds   ds      g
             –2.0 × 10 –6
                                                 V ds  = –30 V     0.0014
                                              1E–6
                                     V g  = –30 V  μ = 0.055 cm 2 /(V . s)
             –1.5 × 10 –6                                          0.0012
                                              1E–7                 0.0010
            I ds  (A)  –1.0 × 10 –6  V g  = –25 V  I ds (A)  1E–8  0.0008  I ds 1/2  (A) 1/2
                                                                   0.0006
                                              1E–9
                                                                   0.0004
             –5.0 × 10 –7            V g  = –20 V
                                             1E–10                 0.0002
                                     V g  = –15 V
                                                                   0.0000
                 0.0                 V g  = –10 V  1E–11
                     –5  –10  –15  –20  –25  –30  10  0  –10  –20  –30
                          V ds  (V)                     V g  (V)
                           (a)                           (b)
          FIGURE 2.5  (a) I –V  output characteristics at different gate voltage for top-contact
                      ds  ds
          D3ANT OTFT. (b) I –V  transfer characteristic curves and plot of I ds 1/2  vs. V  at constant
                                                              g
                         g
                       ds
          V =−30 V. (Reproduced by permission of the Royal Society of Chemistry, Ref. 131.)
           ds
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