Page 23 - Photodetection and Measurement - Maximizing Performance in Optical Systems
P. 23

Photodetection Basics

            16   Chapter One

                        the junction bandgap energy (Sze 1969). Different processing parameters
                        during manufacture can have a large effect on C p. In Chaps. 2 and 3 we will see
                        how important is  C p to the speed and noise performance of an amplified
                        photodetector.

            1.7.6 Leakage resistance
                        All photodiodes act as though they have a resistance shunting the diode (R sh in
                        Fig. 1.7). Its value depends on the processes used to fabricate the diode sub-
                        strate and junction and decreases with increasing area. A high quality 1-mm 2
                        silicon device (e.g., PIN040 from UDT Sensors Inc.) specifies a leakage resist-
                        ance of typically 1GW and not less than 200MW at room temperature. Tem-
                        perature increase reduces R sh . Other manufacturers publish instead a leakage
                        current or dark current, which is just the current that will flow through the
                        shunt resistance for a specified terminal voltage. If the diode voltage in the
                        actual circuit is zero, then no current will flow and the effects of R sh will be
                        minimized. We will see later that R sh can have a significant effect on the detec-
                        tion signal-to-noise ratio. For low values of R sh even a few millivolts offset from
                        an operational amplifier can lead to significant leakage current.
                          Leakage can be greatly modified by process parameters, although significant
                        reduction is usually at the expense of other diode characteristics. For example,
                                   2
                        the 7.6-mm detection area BPW34 photodiode manufactured by Siemens is
                        specified with a leakage of 2nA at 10-V reverse bias and capacitance of 72pF at
                        zero bias. The very similar BPW33 exhibits only 20-pA dark current, but the
                        parasitic capacitance increases to 750pF under the same conditions.


            1.7.7 Series resistance
                        Series resistance comes from the bulk resistance of the photodiode substrate,
                        from the ohmic contact diffusions, and from the leads. It is probably the least
                        troubling diode characteristic for normal laboratory detection needs but
                        becomes important in high bandwidth systems and in power generators using
                        solar cells.


            1.7.8 Table of representative photodiodes
                        Table 1.2 shows a few representative photodiodes. The BPW34 is a common
                        silicon device in a clear plastic package and has been available for 30 years. The
                        BPW33 looks similar, with the same active area. However, as noted, the dark
                        leakage current has been reduced significantly, at the expense of a tenfold
                        increase in junction capacitance. Items 3 and 4 are modern design silicon devices
                        and show the change in dark current and capacitance incurred by changing the
                        active area. These also offer very low temperature coefficients of responsivity
                        at less than 100ppm/°C. Items 5 and 6 are InGaAs detectors. The first has an
                                    2
                        area of 1mm and a capacitance of 90pF. Item 6 is similar, except that a spheri-
                                                                 2
                        cal lens has been used to accept about 1mm of beam area but focus it onto a

                   Downloaded from Digital Engineering Library @ McGraw-Hill (www.digitalengineeringlibrary.com)
                              Copyright © 2004 The McGraw-Hill Companies. All rights reserved.
                               Any use is subject to the Terms of Use as given at the website.
   18   19   20   21   22   23   24   25   26   27   28